Aoyama; Tetsuo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Aoyama; Tetsuo.The latest application filed is for "etching liquid composition".

Company Profile

0.25.12

Aoyama; Tetsuo - Ikoma N/A JP
Aoyama; Tetsuo - Ikoma-shi JP
Aoyama; Tetsuo - Osaka-shi JP
Aoyama; Tetsuo - Kanagawa JP
Aoyama; Tetsuo - Niigata JP
Aoyama, Tetsuo - Tokyo JP
Aoyama; Tetsuo - Niigata-ken JP
AOYAMA, TETSUO - NIIGATA-SHI JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching liquid composition Grant 8,545,716 - Tago , et al. October 1, 2	2013-10-01
Etching Liquid Composition App 20100230631 - Tago; Tsuguhiro ; et al.	2010-09-16
Anisotropic Silicon Etchant Composition App 20090218542 - Isami; Kenji ; et al.	2009-09-03
Aqueous fluoride compositions for cleaning semiconductor devices App 20090099051 - Aoyama; Tetsuo ; et al.	2009-04-16
Aqueous fluoride compositions for cleaning semiconductor devices Grant 7,399,365 - Aoyama , et al. July 15, 2	2008-07-15
Separation-material composition for photo-resist and manufacturing method of semiconductor device Grant 7,341,827 - Muramatsu , et al. March 11, 2	2008-03-11
Cleaning composition for removing resists and method of manufacturing semiconductor device Grant 7,250,391 - Kanno , et al. July 31, 2	2007-07-31
Cleaning agent and cleaning method Grant 6,875,288 - Gotoh , et al. April 5, 2	2005-04-05
Aqueous fluoride compositions for cleaning semiconductor devices App 20050014667 - Aoyama, Tetsuo ; et al.	2005-01-20
Cleaning composition for removing resists and method of manufacturing semiconductor device App 20040106531 - Kanno, Itaru ; et al.	2004-06-03
Photoresist stripper composition App 20040081922 - Ikemoto, Kazuto ; et al.	2004-04-29
Separation-material composition for photo-resist and manufacturing method of semiconductor device App 20040038154 - Muramatsu, Masafumi ; et al.	2004-02-26
Cleaning agent and cleaning process using the same Grant 6,686,322 - Nohara , et al. February 3, 2	2004-02-03
Resist stripping agent and process of producing semiconductor devices using the same Grant 6,638,694 - Ikemoto , et al. October 28, 2	2003-10-28
Resist Stripping Agent And Process Of Producing Semiconductor Devices Using The Same App 20030186175 - Ikemoto, Kazuto ; et al.	2003-10-02
Cleaning method using an oxidizing agent, chelating agent and fluorine compound Grant 6,514,352 - Gotoh , et al. February 4, 2	2003-02-04
Photoresist stripping composition and process for stripping photoresist Grant 6,458,517 - Nohara , et al. October 1, 2	2002-10-01
Photoresist removing composition Grant 6,440,326 - Maruyama , et al. August 27, 2	2002-08-27
Cleaning method App 20020066465 - Gotoh, Hideto ; et al.	2002-06-06
Cleaning agent and cleaning method App 20020064963 - Gotoh, Hideto ; et al.	2002-05-30
Resist stripping composition Grant 6,372,410 - Ikemoto , et al. April 16, 2	2002-04-16
Photoresist stripping composition and process for stripping photoresist App 20020009674 - Nohara, Masahiro ; et al.	2002-01-24
Resist Film Removing Composition And Method For Manufacturing Thin Film Circuit Element Using The Composition App 20010013502 - NOHARA, MASAHIRO ; et al.	2001-08-16
Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same Grant 6,265,309 - Gotoh , et al. July 24, 2	2001-07-24
Method and apparatus for manufacturing semiconductor device Grant 6,199,567 - Kanno , et al. March 13, 2	2001-03-13
Cleaning liquid for semiconductor devices Grant 5,972,862 - Torii , et al. October 26, 1	1999-10-26
Cleaning liquid for semiconductor devices Grant 5,962,385 - Maruyama , et al. October 5, 1	1999-10-05
Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit Grant 5,846,695 - Iwata , et al. December 8, 1	1998-12-08
Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent Grant 5,630,904 - Aoyama , et al. May 20, 1	1997-05-20
Active carbon materials, process for the preparation thereof and the use thereof Grant 5,338,462 - Abe , et al. August 16, 1	1994-08-16
Active carbon materials, process for the preparation thereof and the use thereof Grant 5,242,879 - Abe , et al. September 7, 1	1993-09-07
Positive type photoresist developer Grant 5,175,078 - Aoyama , et al. December 29, 1	1992-12-29
Surface treating agent for aluminum line pattern substrate Grant 5,174,816 - Aoyama , et al. December 29, 1	1992-12-29
Process for production of quaternary ammonium hydroxides Grant 4,776,929 - Aoyama , et al. October 11, 1	1988-10-11
Process for preparation of tertiary olefins Grant 4,521,638 - Kida , et al. June 4, 1	1985-06-04
Process for preparing hydroperoxide Grant 4,013,725 - Yonemitsu , et al. March 22, 1	1977-03-22

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