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Patent applications and USPTO patent grants for Aoki; Yousuke.The latest application filed is for "photosensitive resin composition, method for forming silica coating film, and apparatus and member each comprising silica coating film".
Patent | Date |
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Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film Grant 8,158,981 - Abe , et al. April 17, 2 | 2012-04-17 |
Photosensitive Resin Composition, Method For Forming Silica Coating Film, And Apparatus And Member Each Comprising Silica Coating Film App 20120021190 - Aoki; Yousuke ;   et al. | 2012-01-26 |
Copy-forgery-inhibited pattern or stamp image combined with image data based on user actions Grant 7,738,143 - Ishimoto , et al. June 15, 2 | 2010-06-15 |
Radiation-sensitive Composition, Method Of Forming Silica-based Coating Film, Silica-based Coating Film, Apparatus And Member Having Silica-based Coating Film And Photosensitizing Agent For Insulating Film App 20100102321 - Abe; Kouichi ;   et al. | 2010-04-29 |
Image Processing Apparatus And Image Processing Method App 20070147929 - ISHIMOTO; Koichi ;   et al. | 2007-06-28 |
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