Aoki; Tomoko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Aoki; Tomoko.The latest application filed is for "coating composition, porous silica-based film, method for producing porous silica-based film and semiconductor device".

Company Profile

0.7.7

Aoki; Tomoko - Tokyo JP
Aoki; Tomoko - Kakegawa JP
Aoki, Tomoko - Kakegawa-shi JP
Aoki, Tomoko - Shizuoka JP
Aoki; Tomoko - Iruma JP
Aoki; Tomoko - Saitama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Coating composition and low dielectric siliceous material produced by using same Grant 7,754,003 - Aoki , et al. July 13, 2	2010-07-13
Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device Grant 7,368,491 - Aoki , et al. May 6, 2	2008-05-06
Coating composition, porous silica-based film, method for producing porous silica-based film and semiconductor device App 20070117892 - Aoki; Tomoko ; et al.	2007-05-24
Coating composition and low dielectric siliceous material produced by using same App 20060246303 - Aoki; Tomoko ; et al.	2006-11-02
Phosphorus-containing silazane composition, phosphorus-containing siliceous film, phosphorus-containing siliceous filler, method for producing phosphorus-containing siliceous film, and semiconductor device App 20060217487 - Aoki; Tomoko ; et al.	2006-09-28
Method for sealing fine groove with siliceous material and substrate having siliceous coating formed thereon Grant 6,767,641 - Shimizu , et al. July 27, 2	2004-07-27
Porous silica coating with low dielectric constant, semiconductor device and coating composition Grant 6,746,714 - Aoki , et al. June 8, 2	2004-06-08
Photosensitive polysilazane composition and method of forming patterned polysilazane film App 20040081912 - Nagahara, Tatsuro ; et al.	2004-04-29
Porous siliceous film having low permittivity, semiconductor devices and coating composition App 20040028828 - Aoki, Tomoko ; et al.	2004-02-12
Porous silica coating with low dielectric constant, semiconductor device and coating composition App 20030152783 - Aoki, Tomoko ; et al.	2003-08-14
Low-permittivity porous siliceous film, semiconductor devices having such films, and coating composition for forming the film App 20030099843 - Aoki, Tomoko ; et al.	2003-05-29
Method for producing ceramic products Grant 5,459,114 - Kaya , et al. October 17, 1	1995-10-17
Polymetalosilazane, process of producing same, silicon nitride based ceramic, and process of preparing same Grant 5,436,398 - Shimizu , et al. July 25, 1	1995-07-25
Silane compound and processes for the preparation thereof Grant 5,359,114 - Aoki , et al. * October 25, 1	1994-10-25

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