Aoki; Hidemitsu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Aoki; Hidemitsu.The latest application filed is for "etching and cleaning methods and etching and cleaning apparatuses used therefor".

Company Profile

0.58.50

Aoki; Hidemitsu - Tokyo N/A JP
Aoki; Hidemitsu - Kanagawa JP
Aoki; Hidemitsu - Kawasaki JP
Aoki; Hidemitsu - Minato-ku JP
Aoki, Hidemitsu - Kawasaki-shi JP
Aoki, Hidemitsu - Nakahara-ku JP
Aoki; Hidemitsu - Toyko JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching and cleaning methods and etching and cleaning apparatuses used therefor Grant 8,420,549 - Yamasaki , et al. April 16, 2	2013-04-16
Method for manufacturing semiconductor device and semiconductor device Grant 8,129,287 - Suzuki , et al. March 6, 2	2012-03-06
Etching And Cleaning Methods And Etching And Cleaning Apparatuses Used Therefor App 20110130010 - YAMASAKI; Shinya ; et al.	2011-06-02
Manufacturing method for semiconductor device Grant 7,943,516 - Aoki , et al. May 17, 2	2011-05-17
Etching and cleaning methods and etching and cleaning apparatuses used therefor Grant 7,862,658 - Yamasaki , et al. January 4, 2	2011-01-04
Method of forming a high-k film on a semiconductor device Grant 7,718,532 - Tomimori , et al. May 18, 2	2010-05-18
Semiconductor device and method for manufacturing same Grant 7,687,918 - Kunimune , et al. March 30, 2	2010-03-30
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Grant 7,592,266 - Aoki , et al. September 22, 2	2009-09-22
Process for making a semiconductor device having a roughened surface Grant 7,560,372 - Tomimori , et al. July 14, 2	2009-07-14
Method for removing contamination and method for fabricating semiconductor device Grant 7,442,652 - Aoki , et al. October 28, 2	2008-10-28
Method For Manufacturing Semiconductor Device And Semiconductor Device App 20080248651 - Suzuki; Tatsuya ; et al.	2008-10-09
Cleaning solution and manufacturing method for semiconductor device App 20080214002 - Aoki; Hidemitsu ; et al.	2008-09-04
Method for manufacturing semiconductor device and semiconductor device Grant 7,402,530 - Suzuki , et al. July 22, 2	2008-07-22
Cleaning solution and manufacturing method for semiconductor device Grant 7,368,064 - Aoki , et al. May 6, 2	2008-05-06
Method of forming a high-k film on a semiconductor device App 20080081445 - Tomimori; Hiroaki ; et al.	2008-04-03
Tungsten metal removing solution and method for removing tungsten metal by use thereof Grant 7,351,354 - Shimizu , et al. April 1, 2	2008-04-01
Removing Solution, Cleaning Method For Semiconductor Substrate, And Process For Production Of Semiconductor Device App 20080066779 - AOKI; Hidemitsu ; et al.	2008-03-20
Cleaning solution for semiconductor substrate Grant 7,312,186 - Takashima , et al. December 25, 2	2007-12-25
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device Grant 7,312,160 - Aoki , et al. December 25, 2	2007-12-25
Manufacturing method of semiconductor device Grant 7,268,087 - Aoki , et al. September 11, 2	2007-09-11
Method of forming a high-k film on a semiconductor device Grant 7,192,835 - Tomimori , et al. March 20, 2	2007-03-20
Anticorrosive treating concentrate Grant 7,186,354 - Aoki , et al. March 6, 2	2007-03-06
Semiconductor device having a roughened surface Grant 7,170,172 - Tomimori , et al. January 30, 2	2007-01-30
Process or making a semiconductor device having a roughened surface App 20070015351 - Tomimori; Hiroaki ; et al.	2007-01-18
Semiconductor washing solution and method of producing semiconductor device using the same Grant 7,141,121 - Aoki November 28, 2	2006-11-28
Washing liquid composition for semiconductor substrate Grant 7,138,362 - Abe , et al. November 21, 2	2006-11-21
Method for manufacturing semiconductor device and semiconductor device App 20060234513 - Suzuki; Tatsuya ; et al.	2006-10-19
Post-CMP washing liquid composition Grant 7,087,562 - Abe , et al. August 8, 2	2006-08-08
Method for manufacturing semiconductor device and semiconductor device Grant 7,087,494 - Suzuki , et al. August 8, 2	2006-08-08
Substrate processing apparatus App 20060081180 - Aoki; Hidemitsu ; et al.	2006-04-20
Cleaning method, method for fabricating semiconductor device and cleaning solution Grant 6,998,352 - Aoki , et al. February 14, 2	2006-02-14
Stripping agent composition and method of stripping Grant 6,992,050 - Koita , et al. January 31, 2	2006-01-31
Etching and cleaning methods and etching and cleaning apparatuses used therefor App 20050257889 - Yamasaki, Shinya ; et al.	2005-11-24
Etching and cleaning methods and etching and cleaning apparatuses used therefor Grant 6,964,724 - Yamasaki , et al. November 15, 2	2005-11-15
Cleaning solution and manufacturing method for semiconductor device App 20050236362 - Aoki, Hidemitsu ; et al.	2005-10-27
Preparation process for semiconductor device Grant 6,949,465 - Aoki , et al. September 27, 2	2005-09-27
Tungsten metal removing solution and method for removing tungsten metal by use thereof App 20050156140 - Shimizu, Toshikazu ; et al.	2005-07-21
Semiconductor wafer surface and method of treating a semiconductor wafer surface Grant 6,897,150 - Aoki , et al. May 24, 2	2005-05-24
Method of manufacturing semiconductor device and apparatus for cleaning substrate Grant 6,890,391 - Aoki , et al. May 10, 2	2005-05-10
Semiconductor device fabricating method and treating liquid Grant 6,890,864 - Aoki , et al. May 10, 2	2005-05-10
Chemical solution treatment apparatus for semiconductor substrate Grant 6,877,518 - Watanabe , et al. April 12, 2	2005-04-12
Stripping composition Grant 6,869,921 - Koito , et al. March 22, 2	2005-03-22
Method of washing a semiconductor wafer Grant 6,864,187 - Tomimori , et al. March 8, 2	2005-03-08
Manufacturing method of semiconductor device App 20040266171 - Aoki, Hidemitsu ; et al.	2004-12-30
Method and apparatus for storing a semiconductor wafer after its CMP polishing Grant 6,833,109 - Aoki , et al. December 21, 2	2004-12-21
Method for manufacturing semiconductor device App 20040248350 - Tomimori, Hiroaki ; et al.	2004-12-09
Cleaning water for cleaning a wafer and method of cleaning a wafer Grant 6,797,648 - Aoki , et al. September 28, 2	2004-09-28
Manufacturing method of semicondcutor device Grant 6,787,480 - Aoki , et al. September 7, 2	2004-09-07
Photoresist residue remover composition Grant 6,787,293 - Oowada , et al. September 7, 2	2004-09-07
Cleaning solution for semiconductor substrate App 20040161933 - Takashima, Masayuki ; et al.	2004-08-19
Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring Grant 6,767,409 - Aoki , et al. July 27, 2	2004-07-27
Semiconductor device and method for manufacturing same App 20040130030 - Kunimune, Yorinobu ; et al.	2004-07-08
Liquid composition for cleaning hydrophobic substrate and cleaning method therewith App 20040116315 - Aoki, Hidemitsu ; et al.	2004-06-17
Method for manufacturing semiconductor device and semiconductor device App 20040082130 - Suzuki, Tatsuya ; et al.	2004-04-29
Method of manufacturing semiconductor device and apparatus for cleaning substrate App 20040074526 - Aoki, Hidemitsu ; et al.	2004-04-22
Etching and cleaning methods and etching and cleaning apparatuses used therefor App 20040053508 - Yamasaki, Shinya ; et al.	2004-03-18
Semiconductor device washing apparatus and a method of washing a semiconductor device Grant 6,695,683 - Aoki February 24, 2	2004-02-24
Stripping agent composition and method of stripping App 20040029051 - Koita, Tatsuya ; et al.	2004-02-12
Etching and cleaning methods and etching and cleaning apparatus used therefor Grant 6,683,007 - Yamasaki , et al. January 27, 2	2004-01-27
Preparation process for semiconductor device App 20040009658 - Aoki, Hidemitsu ; et al.	2004-01-15
Photoresist residue remover composition App 20040002020 - Oowada, Takuo ; et al.	2004-01-01
Post-CMP washing liquid composition App 20030216270 - Abe, Yumiko ; et al.	2003-11-20
Semiconductor washing solution and method of producing semiconductor device using the same App 20030205241 - Aoki, Hidemitsu	2003-11-06
Semiconductor device and method of manufacturing the same capable of reducing deterioration of low dielectric constant film Grant 6,624,061 - Aoki September 23, 2	2003-09-23
Washing liquid composition for semiconductor substrate App 20030171233 - Abe, Yumiko ; et al.	2003-09-11
Chemical solution treatment apparatus for semiconductor substrate App 20030168088 - Watanabe, Kaori ; et al.	2003-09-11
Method for removing contamination and method for fabricating semiconductor device App 20030148627 - Aoki, Hidemitsu ; et al.	2003-08-07
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device App 20030139045 - Aoki, Hidemitsu ; et al.	2003-07-24
Semiconductor device fabricating method and treating liquid App 20030134507 - Aoki, Hidemitsu ; et al.	2003-07-17
Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions Grant 6,592,677 - Tomimori , et al. July 15, 2	2003-07-15
Stripping composition App 20030130147 - Koito, Tatsuya ; et al.	2003-07-10
Semiconductor device and method for producing the same App 20030111731 - Tomimori, Hiroaki ; et al.	2003-06-19
Wash water or immersion water used during semiconductor manufacturing App 20030094610 - Aoki, Hidemitsu ; et al.	2003-05-22
Cleaning method, method for fabricating semiconductor device and cleaning solution App 20030087524 - Aoki, Hidemitsu ; et al.	2003-05-08
Semiconductor device fabricating method and treating liquid App 20030027418 - Aoki, Hidemitsu ; et al.	2003-02-06
Method of washing a semiconductor wafer App 20030013310 - Tomimori, Hiroaki ; et al.	2003-01-16
Cleaning water for cleaning a wafer and method of cleaning a wafer App 20020189639 - Aoki, Hidemitsu ; et al.	2002-12-19
Manufacturing method of semiconductor device App 20020155702 - Aoki, Hidemitsu ; et al.	2002-10-24
Method for removing dry-etching residue in a semiconductor device fabricating process Grant 6,465,352 - Aoki October 15, 2	2002-10-15
Composition of photoresist remover effective against etching residue without damage to corrodible metal layer and process using the same App 20020146647 - Aoki, Hidemitsu ; et al.	2002-10-10
Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring App 20020144710 - Aoki, Hidemitsu ; et al.	2002-10-10
Substrate-cleaning method and substrate-cleaning solution Grant 6,444,583 - Aoki September 3, 2	2002-09-03
Manufacturing method of semiconductor device App 20020072191 - Aoki, Hidemitsu ; et al.	2002-06-13
Semiconductor Device And Method Of Manufacturing The Same Capable Of Reducing Deterioration Of Low Dielectric Constant Film App 20020066941 - AOKI, HIDEMITSU	2002-06-06
Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring Grant 6,387,190 - Aoki , et al. May 14, 2	2002-05-14
Method Of Manufacturing A Semiconductor Device App 20020034874 - AOKI, HIDEMITSU	2002-03-21
Cleaning liquid App 20010056052 - Aoki, Hidemitsu ; et al.	2001-12-27
Method for cleaning a substrate and cleaning solution Grant 6,319,801 - Wake , et al. November 20, 2	2001-11-20
Anticorrosive treating concentrate App 20010030315 - Aoki, Hidemitsu ; et al.	2001-10-18
Substrate-cleaning method and substrate-cleaning solution App 20010029104 - Aoki, Hidemitsu	2001-10-11
Process for manufacturing a semiconductor device App 20010024852 - Aoki, Hidemitsu ; et al.	2001-09-27
Remover for a ruthenium containing metal and use thereof App 20010023701 - Aoki, Hidemitsu ; et al.	2001-09-27
Semiconductor device washing apparatus and a method of washing a semiconductor device App 20010021623 - Aoki, Hidemitsu	2001-09-13
Stripper composition and stripping method App 20010014534 - Aoki, Hidemitsu ; et al.	2001-08-16
Anticorrosive agent App 20010011515 - Aoki, Hidemitsu ; et al.	2001-08-09
Method of supplying a chemical mechanical polishing liquid and apparatus therefor Grant 6,183,351 - Aoki February 6, 2	2001-02-06
Method for manufacturing semiconductor device Grant 6,136,708 - Aoki October 24, 2	2000-10-24
Cleaning solution for cleaning substrates to which a metallic wiring has been applied Grant 6,080,709 - Ishikawa , et al. June 27, 2	2000-06-27
Method for collecting a metallic contaminants from a wafer Grant 5,994,142 - Yamasaki , et al. November 30, 1	1999-11-30
Method and system for generating electrolyzed water Grant 5,833,831 - Kitajima , et al. November 10, 1	1998-11-10
Method for producing electrolyzed water Grant 5,762,779 - Shiramizu , et al. June 9, 1	1998-06-09
Method for wet processing of a semiconductor substrate Grant 5,676,760 - Aoki , et al. October 14, 1	1997-10-14
Method and apparatus for cleaning electronic parts Grant 5,635,053 - Aoki , et al. June 3, 1	1997-06-03
Electrolytic ionized water producing apparatus Grant 5,616,221 - Aoki , et al. April 1, 1	1997-04-01
Method for producing electrolyzed water Grant 5,599,438 - Shiramizu , et al. February 4, 1	1997-02-04
Method and apparatus for wet treatment of solid surfaces Grant 5,578,193 - Aoki , et al. November 26, 1	1996-11-26
Method for producing electrolyzed water Grant 5,543,030 - Shiramizu , et al. August 6, 1	1996-08-06

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.