Anze; Hirohito

Patent Applications and Registrations

Patent applications and USPTO patent grants for Anze; Hirohito.The latest application filed is for "charged particle beam writing method".

Company Profile

0.9.9

Anze; Hirohito - Kamakura JP
ANZE; Hirohito - Kamakura-shi JP
Anze; Hirohito - Kanagawa JP
Anze; Hirohito - Numazu JP
Anze; Hirohito - Shizuoka JP
Anze; Hirohito - Numazu-shi JP
Anze; Hirohito - Kawasaki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Charged particle beam writing method Grant 10,256,073 - Anze	2019-04-09
Charged Particle Beam Writing Method App 20180233324 - ANZE; Hirohito	2018-08-16
Method for forming resist film and charged particle beam writing method Grant 9,633,820 - Ohnishi , et al. April 25, 2	2017-04-25
Mask manufacturing method, mask substrate, and charged beam drawing method Grant 9,581,893 - Anze February 28, 2	2017-02-28
Method For Forming Resist Film And Charged Particle Beam Writing Method App 20160111253 - OHNISHI; Takayuki ; et al.	2016-04-21
Charged particle beam writing method and charged particle beam writing apparatus Grant 9,147,552 - Motosugi , et al. September 29, 2	2015-09-29
Mask Manufacturing Method, Mask Substrate, And Charged Beam Drawing Method App 20150241767 - ANZE; Hirohito	2015-08-27
Charged Particle Beam Writing Method And Charged Particlebeam Writing Apparatus App 20150041671 - MOTOSUGI; Tomoo ; et al.	2015-02-12
Mask blank and method of manufacturing mask Grant 8,367,276 - Okubo , et al. February 5, 2	2013-02-05
Pattern forming method, charged particle beam writing apparatus, and recording medium on which program is recorded Grant 8,133,402 - Ohnishi , et al. March 13, 2	2012-03-13
Charged Particle Beam Apparatus And Method App 20110186744 - ANZE; Hirohito	2011-08-04
Lithography method of electron beam App 20100178611 - Anze; Hirohito ; et al.	2010-07-15
Mask Blank And Method Of Manufacturing Mask App 20090075185 - OKUBO; Yasushi ; et al.	2009-03-19
Pattern Forming Method, Charged Particle Beam Writing Apparatus, And Recording Medium On Which Program Is Recorded App 20080185538 - OHNISHI; Takayuki ; et al.	2008-08-07
Forming Method Of Resist Pattern And Writing Method Of Charged Particle Beam App 20070243487 - Anze; Hirohito ; et al.	2007-10-18
Charged beam lithography method Grant 5,885,747 - Yamasaki , et al. March 23, 1	1999-03-23
Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing Grant 5,863,682 - Abe , et al. January 26, 1	1999-01-26

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