Anthis; Jeffrey W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Anthis; Jeffrey W..The latest application filed is for "ruthenium etching process".

Company Profile

34.69.90

Anthis; Jeffrey W. - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Ruthenium Etching Process App 20220301887 - Kazem; Nasrin ; et al.	2022-09-22
ALD process for NiO film with tunable carbon content Grant 11,396,698 - Anthis , et al. July 26, 2	2022-07-26
Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use Grant 11,332,488 - Anthis , et al. May 17, 2	2022-05-17
Water assisted highly pure ruthenium thin film deposition Grant 11,293,093 - Liu , et al. April 5, 2	2022-04-05
Methods of forming self-aligned vias Grant 11,094,544 - Thompson , et al. August 17, 2	2021-08-17
Precursors for the atomic layer deposition of transition metals and methods of use Grant 11,078,224 - Anthis , et al. August 3, 2	2021-08-03
Ruthenium Film Deposition Using Low Valent Metal Precursors App 20210140041 - Kazem; Nasrin ; et al.	2021-05-13
Methods To Grow Low Resistivity Metal Containing Films App 20210123136 - Kalutarage; Lakmal C. ; et al.	2021-04-29
Deposition Of Metal-Organic Oxide Films App 20210066592 - Liu; Feng Q. ; et al.	2021-03-04
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof Grant 10,906,925 - Schmiege , et al. February 2, 2	2021-02-02
Reducing Gate Induced Drain Leakage In Dram Wordline App 20200388621 - Kang; Sung-Kwan ; et al.	2020-12-10
Metal Precursors With Modified Diazabutadiene Ligands For CVD And ALD And Methods Of Use App 20200377538 - Anthis; Jeffrey W. ; et al.	2020-12-03
Seamless ruthenium gap fill Grant 10,790,188 - Kazem , et al. September 29, 2	2020-09-29
Reducing gate induced drain leakage in DRAM wordline Grant 10,790,287 - Kang , et al. September 29, 2	2020-09-29
Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use Grant 10,752,649 - Anthis , et al. A	2020-08-25
Nitrogen-containing ligands and their use in atomic layer deposition methods Grant 10,738,008 - Anthis , et al. A	2020-08-11
Acetylide-based silicon precursors and their use as ALD/CVD precursors Grant 10,699,897 - Saly , et al.	2020-06-30
Reducing Gate Induced Drain Leakage In Dram Wordline App 20200176451 - Kang; Sung-Kwan ; et al.	2020-06-04
Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses Thereof App 20200148712 - Schmiege; Benjamin ; et al.	2020-05-14
In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD Grant 10,643,838 - Schmiege , et al.	2020-05-05
Selective deposition defects removal by chemical etch Grant 10,643,840 - Anthis , et al.	2020-05-05
System and method for controllable non-volatile metal removal Grant 10,633,743 - Chen , et al.	2020-04-28
Gap-Fill With Aluminum-Containing Films App 20200095674 - Saly; Mark ; et al.	2020-03-26
Methods Of Depositing Metal Carbide Films App 20200071825 - Kalutarage; Lakmal C. ; et al.	2020-03-05
Ruthenium precursors for ALD and CVD thin film deposition and uses thereof Grant 10,577,386 - Schmiege , et al.	2020-03-03
Oxygen Free Deposition Of Platinum Group Metal Films App 20200063263 - Yang; Yixiong ; et al.	2020-02-27
Methods Of Forming Self-Aligned Vias App 20190385849 - Thompson; David ; et al.	2019-12-19
Methods of depositing metal films using metal oxyhalide precursors Grant 10,483,116 - Fu , et al. Nov	2019-11-19
Oxide and metal removal Grant 10,465,294 - Wang , et al. No	2019-11-05
Methods of forming self-aligned vias Grant 10,410,865 - Thompson , et al. Sept	2019-09-10
Nitrogen-Containing Ligands And Their Use In Atomic Layer Deposition Methods App 20190256467 - Anthis; Jeffrey W. ; et al.	2019-08-22
Film deposition using precursors containing amidoimine ligands Grant 10,364,492 - Anthis , et al.	2019-07-30
Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals Grant 10,323,054 - Schmiege , et al.	2019-06-18
Nitrogen-containing ligands and their use in atomic layer deposition methods Grant 10,315,995 - Anthis , et al.	2019-06-11
Methods of etching films comprising transition metals Grant 10,297,462 - Anthis , et al.	2019-05-21
Seamless Ruthenium Gap Fill App 20190115255 - Kazem; Nasrin ; et al.	2019-04-18
Selective dry etching of metal films comprising multiple metal oxides Grant 10,242,885 - Anthis , et al.	2019-03-26
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors App 20190088489 - Fu; Xinyu ; et al.	2019-03-21
Methods of etching films with reduced surface roughness Grant 10,233,547 - Schmiege , et al.	2019-03-19
Low Temperature Deposition Of Iridium Containing Films App 20190078203 - Liu; Feng Q. ; et al.	2019-03-14
Selective Deposition Defects Removal By Chemical Etch App 20190080904 - Anthis; Jeffrey W. ; et al.	2019-03-14
Lanthanide, Yttrium and Scandium precursors for ALD, CVD and Thin Film Doping and Methods of Use App 20190062916 - Schmiege; Benjamin ; et al.	2019-02-28
Methods Of Forming Self-Aligned Vias App 20190013202 - Thompson; David ; et al.	2019-01-10
In-Situ Formation of Non-Volatile Lanthanide Thin Film Precursors and Use in ALD and CVD App 20180366322 - Schmiege; Benjamin ; et al.	2018-12-20
Selective Dry Etching of Metal Films Comprising Multiple Metal Oxides App 20180342403 - Anthis; Jeffrey W. ; et al.	2018-11-29
Methods of depositing metal films using metal oxyhalide precursors Grant 10,121,671 - Fu , et al. November 6, 2	2018-11-06
Chemical modification of hardmask films for enhanced etching and selective removal Grant 10,115,593 - Knapp , et al. October 30, 2	2018-10-30
Metal Precursors With Modified Diazabutadiene Ligands For Cvd And Ald And Methods Of Use App 20180291052 - Anthis; Jeffrey W. ; et al.	2018-10-11
Precursors For The Atomic Layer Deposition Of Transition Metals And Methods Of Use App 20180291051 - Anthis; Jeffrey W. ; et al.	2018-10-11
Seamless trench fill using deposition/etch techniques Grant 10,096,514 - Anthis , et al. October 9, 2	2018-10-09
Methods of forming self-aligned vias Grant 10,083,834 - Thompson , et al. September 25, 2	2018-09-25
System And Method For Controllable Non-Volatile Metal Removal App 20180265988 - Chen; Tsung-Liang ; et al.	2018-09-20
Methods of depositing a metal alloy film Grant 10,036,089 - Thompson , et al. July 31, 2	2018-07-31
Water Assisted Highly Pure Ruthenium Thin Film Deposition App 20180195167 - Liu; Feng Q. ; et al.	2018-07-12
ALD Process For NiO Film With Tunable Carbon Content App 20180195170 - Anthis; Jeffrey W. ; et al.	2018-07-12
Methods of Etching Films with Reduced Surface Roughness App 20180195179 - Schmiege; Benjamin ; et al.	2018-07-12
System and method for controllable non-volatile metal removal Grant 10,000,853 - Chen , et al. June 19, 2	2018-06-19
Ruthenium Precursors For ALD And CVD Thin Film Deposition And Uses Thereof App 20180155379 - Schmiege; Benjamin ; et al.	2018-06-07
Precursors For Deposition Of Metal, Metal Nitride And Metal Oxide Based Films Of Transition Metals App 20180148466 - Schmiege; Benjamin ; et al.	2018-05-31
Deposition of metal films using beta-hydrogen free precursors Grant 9,982,345 - Thompson , et al. May 29, 2	2018-05-29
Methods Of Forming Self-Aligned Vias App 20180096847 - Thompson; David ; et al.	2018-04-05
Chemical Modification Of Hardmask Films For Enhanced Etching And Selective Removal App 20180096834 - KNAPP; David ; et al.	2018-04-05
Tungsten films by organometallic or silane pre-treatment of substrate Grant 9,922,872 - Knapp , et al. March 20, 2	2018-03-20
Methods of etching films with reduced surface roughness Grant 9,896,770 - Schmiege , et al. February 20, 2	2018-02-20
Methods Of Etching Films Comprising Transition Metals App 20180040486 - Anthis; Jeffrey W. ; et al.	2018-02-08
Seamless Trench Fill Using Deposition/Etch Techniques App 20180033689 - Anthis; Jeffrey W. ; et al.	2018-02-01
Chemical modification of hardmask films for enhanced etching and selective removal Grant 9,870,915 - Knapp , et al. January 16, 2	2018-01-16
Lanthanide, Yttrium And Scandium Precursors For ALD, CVD And Thin Film Doping And Methods Of Use App 20170356083 - Anthis; Jeffrey W. ; et al.	2017-12-14
Lanthanum Precursors For Deposition Of Lanthanum, Lanthanum Oxide And Lanthanum Nitride Films App 20170358444 - Thompson; David ; et al.	2017-12-14
Methods of etching films comprising transition metals Grant 9,799,533 - Anthis , et al. October 24, 2	2017-10-24
Film deposition using tantalum precursors Grant 9,721,787 - Thompson , et al. August 1, 2	2017-08-01
Acetylide-Based Silicon Precursors And Their Use As ALD/CVD Precursors App 20170213726 - Saly; Mark ; et al.	2017-07-27
Selective etch for metal-containing materials Grant 9,711,366 - Ingle , et al. July 18, 2	2017-07-18
Deposition of films comprising aluminum alloys with high aluminum content Grant 9,683,287 - Thompson , et al. June 20, 2	2017-06-20
System And Method For Controllable Non-Volatile Metal Removal App 20170159188 - Chen; Tsung-Liang ; et al.	2017-06-08
Nitrogen-Containing Ligands And Their Use In Atomic Layer Deposition Methods App 20170121287 - Anthis; Jeffrey W. ; et al.	2017-05-04
Methods Of Etching Films With Reduced Surface Roughness App 20170096740 - Schmiege; Benjamin ; et al.	2017-04-06
System and method for controllable non-volatile metal removal Grant 9,611,552 - Chen , et al. April 4, 2	2017-04-04
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors App 20170062224 - Fu; Xinyu ; et al.	2017-03-02
Nitrogen-containing ligands and their use in atomic layer deposition methods Grant 9,580,799 - Anthis , et al. February 28, 2	2017-02-28
Deposition of Metal Films Using Beta-Hydrogen Free Precursors App 20170016113 - Thompson; David ; et al.	2017-01-19
Methods of etching films with reduced surface roughness Grant 9,540,736 - Schmiege , et al. January 10, 2	2017-01-10
Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate App 20160336222 - Knapp; David ; et al.	2016-11-17
Plasma-free metal etch Grant 9,472,417 - Ingle , et al. October 18, 2	2016-10-18
Methods Of Etching Films Comprising Transition Metals App 20160293449 - Anthis; Jeffrey W. ; et al.	2016-10-06
Selectively etching metals and metal nitrides conformally Grant 9,449,843 - Korolik , et al. September 20, 2	2016-09-20
System And Method For Controllable Non-Volatile Metal Removal App 20160265121 - Chen; Tsung-Liang ; et al.	2016-09-15
Oxide And Metal Removal App 20160222522 - Wang; Xikun ; et al.	2016-08-04
Methods of etching films comprising transition metals Grant 9,390,940 - Anthis , et al. July 12, 2	2016-07-12
Methods for the deposition of manganese-containing films using diazabutadiene-based precursors Grant 9,328,415 - Thompson , et al. May 3, 2	2016-05-03
Selective Etch For Metal-containing Materials App 20160118268 - Ingle; Nitin K. ; et al.	2016-04-28
Oxide and metal removal Grant 9,309,598 - Wang , et al. April 12, 2	2016-04-12
Selective etch for metal-containing materials Grant 9,299,582 - Ingle , et al. March 29, 2	2016-03-29
Methods Of Etching Films With Reduced Surface Roughness App 20160032460 - Schmiege; Benjamin ; et al.	2016-02-04
High Through-put And Low Temperature Ald Copper Deposition And Integration App 20160032455 - Liu; Feng Q. ; et al.	2016-02-04
Catalytic Atomic Layer Deposition Of Films Comprising SiOC App 20160002782 - Thompson; David ; et al.	2016-01-07
Oxide And Metal Removal App 20150345028 - Wang; Xikun ; et al.	2015-12-03
Deposition of N-metal films comprising aluminum alloys Grant 9,145,612 - Gandikota , et al. September 29, 2	2015-09-29
Bisamineazaallylic ligands and their use in atomic layer deposition methods Grant 9,127,031 - Thompson , et al. September 8, 2	2015-09-08
Precursors and methods for the selective deposition of cobalt and manganese on metal surfaces Grant 9,090,641 - Anthis July 28, 2	2015-07-28
Plasma-free Metal Etch App 20150129546 - Ingle; Nitin K. ; et al.	2015-05-14
Selective Etch For Metal-containing Materials App 20150129545 - Ingle; Nitin K. ; et al.	2015-05-14
Film Deposition Using Precursors Containing Amidoimine Ligands App 20150118100 - Anthis; Jeffrey W. ; et al.	2015-04-30
Methods for depositing films comprising cobalt and cobalt nitrides Grant 9,005,704 - Thompson , et al. April 14, 2	2015-04-14
Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devices Grant 8,993,058 - Anthis , et al. March 31, 2	2015-03-31
Methods for manufacturing high dielectric constant films Grant 8,927,438 - Kim , et al. January 6, 2	2015-01-06
Deposition of metal films using alane-based precursors Grant 8,927,059 - Lu , et al. January 6, 2	2015-01-06
Methods Of Depositing A Metal Alloy Film App 20150004316 - Thompson; David ; et al.	2015-01-01
Methods for the Deposition Of Manganese-Containing Films Using Diazabutadiene-Based Precursors App 20140363575 - Thompson; David ; et al.	2014-12-11
Method of atomic layer deposition using metal precursors Grant 8,906,457 - Thompson , et al. December 9, 2	2014-12-09
Methods Of Etching Films Comprising Transition Metals App 20140273492 - Anthis; Jeffrey W. ; et al.	2014-09-18
Methods For Depositing Films Comprising Cobalt And Cobalt Nitrides App 20140255606 - Thompson; David ; et al.	2014-09-11
Activated silicon precursors for low temperature deposition Grant 8,821,986 - Weidman , et al. September 2, 2	2014-09-02
In situ vapor phase surface activation of SiO.sub.2 Grant 8,778,816 - Sato , et al. July 15, 2	2014-07-15
Precursors and methods for the atomic layer deposition of manganese Grant 8,734,902 - Thompson , et al. May 27, 2	2014-05-27
Deposition Of Films Comprising Aluminum Alloys With High Aluminum Content App 20140112824 - Thompson; David ; et al.	2014-04-24
Nitrogen-Containing Ligands And Their Use In Atomic Layer Deposition Methods App 20140102365 - Anthis; Jeffrey W. ; et al.	2014-04-17
Methods And Apparatus For Forming Tantalum Silicate Layers On Germanium Or III-V Semiconductor Devices App 20140065842 - Anthis; Jeffrey W. ; et al.	2014-03-06
Use of nitrogen-containing ligands in atomic layer deposition methods Grant 8,632,853 - Anthis , et al. January 21, 2	2014-01-21
Deposition Of N-Metal Films Comprising Aluminum Alloys App 20140017408 - Gandikota; Srinivas ; et al.	2014-01-16
Bisamineazaallylic Ligands And Their Use In Atomic Layer Deposition Methods App 20130267709 - Thompson; David ; et al.	2013-10-10
Precursors And Methods For The Selective Deposition Of Cobalt And Manganese On Metal Surfaces App 20130236657 - Anthis; Jeffrey W.	2013-09-12
Bisamineazaallylic ligands and their use in atomic layer deposition methods Grant 8,481,119 - Thompson , et al. July 9, 2	2013-07-09
Film Deposition Using Tantalum Precursors App 20130157475 - Thompson; David ; et al.	2013-06-20
Deposition Of Metal Films Using Alane-based Precursors App 20130115383 - Lu; Xinliang ; et al.	2013-05-09
Metal-Aluminum Alloy Films From Metal Amidinate Precursors And Aluminum Precursors App 20130078454 - Thompson; David ; et al.	2013-03-28
Metal-Aluminum Alloy Films From Metal PCAI Precursors And Aluminum Precursors App 20130078455 - Thompson; David ; et al.	2013-03-28
Activated Silicon Precursors For Low Temperature Deposition App 20130071580 - Weidman; Timothy W. ; et al.	2013-03-21
Method of Atomic Layer Deposition Using Metal Precursors App 20130059077 - Thompson; David ; et al.	2013-03-07
Methods For Manufacturing High Dielectric Constant Films App 20120270409 - Kim; Hyungjun ; et al.	2012-10-25
Precursors and Methods for the Atomic Layer Deposition of Manganese App 20120231164 - Thompson; David ; et al.	2012-09-13
In Situ Vapor Phase Surface Activation Of SiO2 App 20120202357 - Sato; Tatsuya E. ; et al.	2012-08-09
Bisamineazaallylic Ligands And Their Use In Atomic Layer Deposition Methods App 20120107502 - Thompson; David ; et al.	2012-05-03
Nitrogen-Containing Ligands And Their Use In Atomic Layer Deposition Methods App 20120108062 - Anthis; Jeffrey W. ; et al.	2012-05-03

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