Anno; Yusuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Anno; Yusuke.The latest application filed is for "composition, silicon-containing film, method of forming silicon-containing film, and method of treating semiconductor substrate".

Company Profile

2.11.17

Anno; Yusuke - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition, Silicon-containing Film, Method Of Forming Silicon-containing Film, And Method Of Treating Semiconductor Substrate App 20220146940 - KASAI; Tatsuya ; et al.	2022-05-12
Pattern-forming Method And Composition For Resist Pattern-refinement App 20190155162 - MEYA; Kanako ; et al.	2019-05-23
Pattern-forming method and composition for resist pattern-refinement Grant 10,216,090 - Meya , et al. Feb	2019-02-26
Film-forming Material For Resist Process And Pattern-forming Method App 20190025699 - Suzuki; Junya ; et al.	2019-01-24
Resist pattern-forming method Grant 10,025,188 - Anno , et al. July 17, 2	2018-07-17
Resist Pattern-forming Method App 20170322492 - ANNO; Yusuke ; et al.	2017-11-09
Resist Pattern-forming Method App 20160320705 - ANNO; Yusuke ; et al.	2016-11-03
Pattern-forming Method And Composition For Resist Pattern-refinement App 20160291462 - MEYA; Kanako ; et al.	2016-10-06
Polysiloxane composition and pattern-forming method Grant 9,329,478 - Anno , et al. May 3, 2	2016-05-03
Resist Pattern-forming Method App 20160097978 - ANNO; Yusuke ; et al.	2016-04-07
Resist Pattern-forming Method App 20150160556 - ANNO; Yusuke ; et al.	2015-06-11
Pattern-forming method, and composition for forming resist underlayer film Grant 9,046,769 - Matsumura , et al. June 2, 2	2015-06-02
Resist pattern-forming method Grant 8,993,223 - Anno , et al. March 31, 2	2015-03-31
Resist Pattern-forming Method App 20150050600 - ANNO; Yusuke ; et al.	2015-02-19
Pattern-forming Method, And Composition For Forming Resist Underlayer Film App 20140371466 - Matsumura; Yushi ; et al.	2014-12-18
Pattern-forming method, and composition for forming resist underlayer film Grant 8,859,191 - Matsumura , et al. October 14, 2	2014-10-14
Resist Pattern-forming Method App 20140134544 - ANNO; Yusuke ; et al.	2014-05-15
Resist pattern-forming method Grant 8,669,042 - Anno , et al. March 11, 2	2014-03-11
Positive-type radiation-sensitive composition, and resist pattern formation method Grant 8,501,385 - Anno , et al. August 6, 2	2013-08-06
Polysiloxane Composition And Pattern-forming Method App 20130130179 - ANNO; Yusuke ; et al.	2013-05-23
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Compound App 20130022912 - SATO; Mitsuo ; et al.	2013-01-24
Pattern-forming Method, And Composition For Forming Resist Underlayer Film App 20120285929 - MATSUMURA; Yushi ; et al.	2012-11-15
Resist Pattern-forming Method App 20120183908 - ANNO; Yusuke ; et al.	2012-07-19
Resist Pattern Coating Agent And Resist Pattern Forming Method Using The Same App 20110223544 - YADA; Yuji ; et al.	2011-09-15
Positive-type Radiation-sensitive Composition, And Resist Pattern Formation Method App 20110104612 - ANNO; Yusuke ; et al.	2011-05-05

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