Anjur; Sriram P.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Anjur; Sriram P..The latest application filed is for "polishing composition containing polyether amine".
- Anjur; Sriram P. - Aurora IL US
| Patent | Date |
|---|---|
| Polishing composition containing polyether amine Grant 8,741,009 - Dysard , et al. June 3, 2 | 2014-06-03 |
| Polishing composition containing polyether amine App 20090289033 - Dysard; Jeffrey M. ; et al. | 2009-11-26 |
| Polishing composition containing polyether amine Grant 7,585,340 - Dysard , et al. September 8, 2 | 2009-09-08 |
| Electrochemical-mechanical polishing system Grant 7,438,795 - Wylie , et al. October 21, 2 | 2008-10-21 |
| Polishing composition containing polyether amine App 20070251155 - Dysard; Jeffrey M. ; et al. | 2007-11-01 |
| Electrochemical-mechanical polishing system App 20050274627 - Wylie, Ian W. ; et al. | 2005-12-15 |
| Polishing pad comprising particles with a solid core and polymeric shell Grant 6,685,540 - Cherian , et al. February 3, 2 | 2004-02-03 |
| Polishing pad comprising particles with a solid core and polymeric shell App 20030100244 - Cherian, Isaac K. ; et al. | 2003-05-29 |
| Polishing pads for a semiconductor substrate Grant 6,126,532 - Sevilla , et al. October 3, 2 | 2000-10-03 |
| Polishing pad for a semiconductor substrate Grant 6,117,000 - Anjur , et al. September 12, 2 | 2000-09-12 |
| Polishing pad for a semiconductor substrate Grant 6,062,968 - Sevilla , et al. May 16, 2 | 2000-05-16 |
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