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Thermal history devices, systems for thermal history detection, and methods for thermal history detection
Grant 9,976,913 - Caraveo Frescas , et al. May 22, 2 | 2018-05-22 |
Fractional order capacitor
Grant 9,305,706 - Almadhoun , et al. April 5, 2 | 2016-04-05 |
Thermal History Devices, Systems For Thermal History Detection, And Methods For Thermal History Detection
App 20150146761 - Caraveo Frescas; Jesus Alfonso ; et al. | 2015-05-28 |
Fractional Order Capacitor
App 20140266374 - Almadhoun; Mahmoud N. ; et al. | 2014-09-18 |
Work function adjustment with the implant of lanthanides
Grant 8,409,943 - Ramin , et al. April 2, 2 | 2013-04-02 |
Method of forming a high-k gate dielectric layer
Grant 8,304,333 - Ramin , et al. November 6, 2 | 2012-11-06 |
Work Function Adjustment With The Implant Of Lanthanides
App 20110223757 - Ramin; Manfred ; et al. | 2011-09-15 |
Nitrogen profile in high-K dielectrics using ultrathin disposable capping layers
Grant 8,008,216 - Alshareef , et al. August 30, 2 | 2011-08-30 |
Method Of Forming A High-k Gate Dielectric Layer
App 20110006375 - Ramin; Manfred ; et al. | 2011-01-13 |
Work function adjustment with the implant of lanthanides
Grant 7,858,459 - Ramin , et al. December 28, 2 | 2010-12-28 |
Lanthanide series metal implant to control work function of metal gate electrodes
Grant 7,807,522 - Alshareef , et al. October 5, 2 | 2010-10-05 |
Method of forming a high-k gate dielectric layer
Grant 7,799,669 - Ramin , et al. September 21, 2 | 2010-09-21 |
Nitrogen Profile in High-K Dielectrics Using Ultrathin Disposable Capping Layers
App 20090104743 - Alshareef; Husam ; et al. | 2009-04-23 |
Mosfet With Metal Gate Electrode
App 20090039441 - Luna; Hongfa ; et al. | 2009-02-12 |
Method Of Forming A High-k Gate Dielectric Layer
App 20080265336 - Ramin; Manfred ; et al. | 2008-10-30 |
Work Function Adjustment With The Implant Of Lanthanides
App 20080261368 - Ramin; Manfred ; et al. | 2008-10-23 |
Thermal Anneal Method For A High-k Dielectric
App 20080242114 - Quevedo-Lopez; Manuel ; et al. | 2008-10-02 |
Lanthanide series metal implant to control work function of metal gate electrodes
App 20080160736 - Alshareef; Husam ; et al. | 2008-07-03 |
Methods of modulating the work functions of film layers
Grant 7,332,433 - Choi , et al. February 19, 2 | 2008-02-19 |
CMOS Device Having Different Amounts of Nitrogen in the NMOS Gate Dielectric Layers and PMOS Gate Dielectric Layers
App 20070207572 - Varghese; Ajith ; et al. | 2007-09-06 |
CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers
Grant 7,227,201 - Varghese , et al. June 5, 2 | 2007-06-05 |
Methods of modulating the work functions of film layers
App 20070063296 - Choi; Kisik ; et al. | 2007-03-22 |
Dual Metal Gate and Method of Manufacture
App 20070059874 - Moumen; Naim ; et al. | 2007-03-15 |
Methods for dual metal gate CMOS integration
App 20070048920 - Song; Seung-Chul ; et al. | 2007-03-01 |
Monitoring of nitrided oxide gate dielectrics by determination of a wet etch
Grant 7,087,440 - Gurba , et al. August 8, 2 | 2006-08-08 |
CMOS device having different amounts of nitrogen in the NMOS gate dielectric layers and PMOS gate dielectric layers
App 20060043369 - Varghese; Ajith ; et al. | 2006-03-02 |
Monitoring of nitrided oxide gate dielectrics by determination of a wet etch
App 20040235203 - Gurba, April ; et al. | 2004-11-25 |
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