loadpatents
name:-0.049247026443481
name:-0.031652927398682
name:-0.0031731128692627
Allison; William C. Patent Filings

Allison; William C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Allison; William C..The latest application filed is for "polishing pad having polishing surface with continuous protrusions".

Company Profile
4.42.59
  • Allison; William C. - Beaverton OR
  • Allison; William C. - Murrieta CA
  • - Beaverton OR US
  • Allison; William C. - Murrysville PA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Low density polishing pad
Grant 10,946,495 - Huang , et al. March 16, 2
2021-03-16
Polishing pad having polishing surface with continuous protrusions
Grant 10,293,459 - Lefevre , et al.
2019-05-21
Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
Grant 10,160,092 - Lefevre , et al. Dec
2018-12-25
Polishing pad with foundation layer and polishing surface layer
Grant 9,931,728 - Allison , et al. April 3, 2
2018-04-03
Polishing pad with grooved foundation layer and polishing surface layer
Grant 9,931,729 - Lefevre , et al. April 3, 2
2018-04-03
Polishing pad with foundation layer and window attached thereto
Grant 9,868,185 - Lefevre , et al. January 16, 2
2018-01-16
Polishing Pad Having Polishing Surface With Continuous Protrusions
App 20170203409 - LEFEVRE; Paul Andre ;   et al.
2017-07-20
Polishing pad having polishing surface with continuous protrusions
Grant 9,649,742 - Lefevre , et al. May 16, 2
2017-05-16
Polishing Pad With Foundation Layer And Window Attached Thereto
App 20170120417 - Lefevre; Paul Andre ;   et al.
2017-05-04
Method of fabricating a polishing
Grant 9,597,770 - Allison , et al. March 21, 2
2017-03-21
Homogeneous polishing pad for eddy current end-point detection
Grant 9,597,777 - Allison , et al. March 21, 2
2017-03-21
Polishing pad with multi-modal distribution of pore diameters
Grant 9,555,518 - Huang , et al. January 31, 2
2017-01-31
Low Density Polishing Pad
App 20160221145 - Huang; Ping ;   et al.
2016-08-04
Polishing pad with homogeneous body having discrete protrusions thereon
Grant 9,296,085 - Bajaj , et al. March 29, 2
2016-03-29
Polishing pad with alignment feature
Grant 9,249,273 - Kerprich , et al. February 2, 2
2016-02-02
Polishing Pad With Concentric Or Approximately Concentric Polygon Groove Pattern
App 20160023322 - Allison; William C. ;   et al.
2016-01-28
Polishing pad having porogens with liquid filler
Grant 9,238,294 - Lefevre , et al. January 19, 2
2016-01-19
Polishing Pad Having Porogens With Liquid Filler
App 20150367478 - Lefevre; Paul Andre ;   et al.
2015-12-24
Polishing pad with concentric or approximately concentric polygon groove pattern
Grant 9,211,628 - Allison , et al. December 15, 2
2015-12-15
Soft Polishing Pad For Polishing A Semiconductor Substrate
App 20150343595 - Allison; William C. ;   et al.
2015-12-03
Polishing Pad With Foundation Layer And Polishing Surface Layer
App 20150273656 - Allison; William C. ;   et al.
2015-10-01
Polishing Pad With Foundation Layer And Polishing Surface Layer
App 20150273655 - Allison; William C. ;   et al.
2015-10-01
Polishing Pad With Grooved Foundation Layer And Polishing Surface Layer
App 20150266160 - Lefevre; Paul Andre ;   et al.
2015-09-24
Polishing pad with foundation layer and polishing surface layer
Grant 9,067,297 - Allison , et al. June 30, 2
2015-06-30
Polishing pad with grooved foundation layer and polishing surface layer
Grant 9,067,298 - Lefevre , et al. June 30, 2
2015-06-30
Polishing Pad With Alignment Feature
App 20150152236 - Kerprich; Robert ;   et al.
2015-06-04
Polishing pad for eddy current end-point detection
Grant 9,028,302 - Allison , et al. May 12, 2
2015-05-12
Polishing Pad With Aperture
App 20150079878 - Allison; William C. ;   et al.
2015-03-19
Polishing pad with alignment feature
Grant 8,968,058 - Kerprich , et al. March 3, 2
2015-03-03
Polishing Pad With Homogeneous Body Having Discrete Protrusions Thereon
App 20150056900 - Bajaj; Rajeev ;   et al.
2015-02-26
Low Density Polishing Pad
App 20150038066 - Huang; Ping ;   et al.
2015-02-05
Polishing pad with alignment aperture
Grant 08920219 -
2014-12-30
Polishing pad with alignment aperture
Grant 8,920,219 - Allison , et al. December 30, 2
2014-12-30
Polishing Pad Having Polishing Surface With Continuous Protrusions Having Tapered Sidewalls
App 20140273777 - Lefevre; Paul Andre ;   et al.
2014-09-18
Polishing Pad Having Polishing Surface With Continuous Protrusions
App 20140206268 - Lefevre; Paul Andre ;   et al.
2014-07-24
Polishing Pad With Multi-modal Distribution Of Pore Diameters
App 20140167305 - Huang; Ping ;   et al.
2014-06-19
Homogeneous Polishing Pad For Eddy Current End-point Detection
App 20140123563 - Allison; William C. ;   et al.
2014-05-08
Polishing pad with multi-modal distribution of pore diameters
Grant 8,702,479 - Huang , et al. April 22, 2
2014-04-22
Polishing Pad for Eddy Current End-Point Detection
App 20140102010 - Allison; William C. ;   et al.
2014-04-17
Homogeneous polishing pad for eddy current end-point detection
Grant 8,657,653 - Allison , et al. February 25, 2
2014-02-25
Polishing pad for eddy current end-point detection
Grant 8,628,384 - Allison , et al. January 14, 2
2014-01-14
Polishing Pad With Polishing Surface Layer Having An Aperture Or Opening Above A Transparent Foundation Layer
App 20130324020 - Lefevre; Paul Andre ;   et al.
2013-12-05
Polishing Pad With Foundation Layer And Polishing Surface Layer
App 20130137350 - Allison; William C. ;   et al.
2013-05-30
Polishing Pad With Grooved Foundation Layer And Polishing Surface Layer
App 20130137349 - Lefevre; Paul Andre ;   et al.
2013-05-30
Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection
Grant 8,439,994 - Allison , et al. May 14, 2
2013-05-14
Polishing Pad With Aperture
App 20130017764 - Allison; William C. ;   et al.
2013-01-17
Polishing Pad With Homogeneous Body Having Discrete Protrusions Thereon
App 20120302148 - Bajaj; Rajeev ;   et al.
2012-11-29
Polishing Pad With Alignment Feature
App 20120282849 - Kerprich; Robert ;   et al.
2012-11-08
Polishing Pad With Concentric Or Approximately Concentric Polygon Groove Pattern
App 20120190281 - Allison; William C. ;   et al.
2012-07-26
Polishing Pad With Multi-modal Distribution Of Pore Diameters
App 20120094586 - Huang; Ping ;   et al.
2012-04-19
Homogeneous Polishing Pad For Eddy Current End-point Detection
App 20120083192 - Allison; William C. ;   et al.
2012-04-05
Polishing Pad For Eddy Current End-point Detection
App 20120083191 - Allison; William C. ;   et al.
2012-04-05
Method Of Fabricating A Polishing Pad With An End-point Detection Region For Eddy Current End-point Detection
App 20120079773 - Allison; William C. ;   et al.
2012-04-05
Method Of Forming A Polyurea Polyurethane Elastomer Containing Chemical Mechanical Polishing Pad
App 20090094900 - Swisher; Robert G. ;   et al.
2009-04-16
Chemical Mechanical Polishing Pad Structure Minimizing Trapped Air And Polishing Fluid Intrusion
App 20090047884 - Swisher; Robert G. ;   et al.
2009-02-19
Process For Preparing A Polyurethane Urea Polishing Pad
App 20080139684 - Swisher; Robert G. ;   et al.
2008-06-12
Polyurethane urea polishing pad
Grant 7,291,063 - Swisher , et al. November 6, 2
2007-11-06
Polyurethane Urea Polishing Pad with Window
App 20070021045 - Swisher; Robert G. ;   et al.
2007-01-25
Polishing pad with window for planarization
App 20070010169 - Swisher; Robert G. ;   et al.
2007-01-11
Polyurethane urea polishing pad
App 20060254706 - Swisher; Robert G. ;   et al.
2006-11-16
Polishing pad
Grant 7,097,549 - Allison , et al. August 29, 2
2006-08-29
Polishing pad
App 20060183412 - Allison; William C. ;   et al.
2006-08-17
Polyurethane urea polishing pad
App 20060089094 - Swisher; Robert G. ;   et al.
2006-04-27
Polyurethane urea polishing pad
App 20060089095 - Swisher; Robert G. ;   et al.
2006-04-27
Polyurethane urea polishing pad
App 20060089093 - Swisher; Robert G. ;   et al.
2006-04-27
Polishing pad for planarization
Grant 6,905,402 - Allison , et al. June 14, 2
2005-06-14
Polishing pad with window for planarization
App 20040209066 - Swisher, Robert G. ;   et al.
2004-10-21
Polishing pad with window for planarization
App 20040102141 - Swisher, Robert G. ;   et al.
2004-05-27
Polishing pad for planarization
App 20040102137 - Allison, William C. ;   et al.
2004-05-27
Polishing pad
App 20030217517 - Allison, William C. ;   et al.
2003-11-27
Inkjet printing media
Grant 6,340,725 - Wang , et al. January 22, 2
2002-01-22
Inkjet printing media
Grant 6,074,761 - Wang , et al. June 13, 2
2000-06-13
Inkjet printing media
Grant 5,880,196 - Cho , et al. March 9, 1
1999-03-09
Company Registrations
SEC0001201124ALLISON WILLIAM C

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