Allison; William
Patent Applications and Registrations
Patent applications and USPTO patent grants for Allison; William.The latest application filed is for "soft polishing pad for polishing a semiconductor substrate".
- Allison; William - Beaverton OR US
- Allison; William - Clifton Park NY
- Allison; William - Preston GB2
- Allison; William - Huntington Station NY
| Patent | Date |
|---|---|
| Soft polishing pad for polishing a semiconductor substrate Grant 9,156,124 - Allison , et al. October 13, 2 | 2015-10-13 |
| CMP pad with local area transparency Grant 9,017,140 - Allison , et al. April 28, 2 | 2015-04-28 |
| Soft Polishing Pad For Polishing A Semiconductor Substrate App 20120009855 - Allison; William ; et al. | 2012-01-12 |
| CMP pad with local area transparency App 20110171883 - Allison; William ; et al. | 2011-07-14 |
| Over-running clutch pulley with increased surface microhardness Grant 7,191,880 - Liston , et al. March 20, 2 | 2007-03-20 |
| Over-running clutch pulley with increased surface microhardness App 20040112700 - Liston, Mary-Jo ; et al. | 2004-06-17 |
| Apparatus for treating waste material Grant 4,297,827 - Allison November 3, 1 | 1981-11-03 |
| Electromechanical resonator Grant 4,044,283 - Allison August 23, 1 | 1977-08-23 |
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