Allen; Robert David

Patent Applications and Registrations

Patent applications and USPTO patent grants for Allen; Robert David.The latest application filed is for "rechargeable metal halide battery".

Company Profile

2.52.47

Allen; Robert David - Golden CO
Allen; Robert David - San Jose CA
Allen; Robert David - Tempe AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Rechargeable Metal Halide Battery App 20220231295 - Kim; Jangwoo ; et al.	2022-07-21
Porous silicon anode for rechargeable metal halide battery Grant 11,367,863 - Kim , et al. June 21, 2	2022-06-21
Feedstock Purification Of Polyester Waste For Recycling Processes App 20220169822 - Breyta; Gregory ; et al.	2022-06-02
Media Recycling And Sanitization App 20220169825 - Breyta; Gregory ; et al.	2022-06-02
Recycling Process For The Recovery Of Cotton From Polyester-cotton Fabrics And/or Fibers App 20220169824 - Breyta; Gregory ; et al.	2022-06-02
Feedstock Engineering Of Polyester Waste For Recycling Processes App 20220169823 - Breyta; Gregory ; et al.	2022-06-02
Thermally Reworkable Adhesives For Electronic Devices App 20220119689 - Dennis; Joseph Michael ; et al.	2022-04-21
Porous Silicon Anode For Rechargeable Metal Halide Battery App 20210151743 - Kim; Jangwoo ; et al.	2021-05-20
Photoacid generating polymers containing a urethane linkage for lithography Grant 9,851,639 - Allen , et al. December 26, 2	2017-12-26
Composite membrane with multi-layered active layer Grant 9,504,967 - Allen , et al. November 29, 2	2016-11-29
Photo-patternable dielectric materials and formulations and methods of use Grant 9,012,587 - Allen , et al. April 21, 2	2015-04-21
Composite Membrane With Multi-layered Active Layer App 20140353253 - Allen; Robert David ; et al.	2014-12-04
Composite membrane with multi-layered active layer Grant 8,857,629 - Allen , et al. October 14, 2	2014-10-14
Polyamide membranes with fluoroalcohol functionality Grant 8,754,139 - Allen , et al. June 17, 2	2014-06-17
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 8,603,584 - Allen , et al. December 10, 2	2013-12-10
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20130292163 - Allen; Robert David ; et al.	2013-11-07
Photoacid Generating Polymers Containing A Urethane Linkage For Lithography App 20130260313 - Allen; Robert David ; et al.	2013-10-03
Photo-patternable dielectric materials and formulations and methods of use Grant 8,431,670 - Allen , et al. April 30, 2	2013-04-30
Polymeric films made from polyhedral oligomeric silsesquioxane (POSS) and a hydrophilic comonomer Grant 8,353,410 - Allen , et al. January 15, 2	2013-01-15
Low activation energy photoresist composition and process for its use Grant 8,168,366 - Allen , et al. May 1, 2	2012-05-01
Composite Membrane With Multi-layered Active Layer App 20120012527 - Allen; Robert David ; et al.	2012-01-19
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials App 20110256713 - Allen; Robert David ; et al.	2011-10-20
High contact angle topcoat material and use thereof in lithography process Grant 8,034,532 - Allen , et al. October 11, 2	2011-10-11
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 8,026,293 - Allen , et al. September 27, 2	2011-09-27
Composite membranes with performance enhancing layers Grant 8,011,517 - Allen , et al. September 6, 2	2011-09-06
Polymeric Films Made From Polyhedral Oligomeric Silsesquioxane (poss) And A Hydrophilic Comonomer App 20110120940 - Allen; Robert David ; et al.	2011-05-26
Composite Membranes With Performance Enhancing Layers App 20110120941 - Allen; Robert David ; et al.	2011-05-26
Photoresist topcoat for a photolithographic process Grant 7,910,290 - Allen , et al. March 22, 2	2011-03-22
Photoresist topcoat for a photolithographic process Grant 7,901,868 - Allen , et al. March 8, 2	2011-03-08
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20110048787 - Allen; Robert David ; et al.	2011-03-03
Low Activation Energy Photoresist Composition and Process for Its Use App 20110008727 - Allen; Robert David ; et al.	2011-01-13
Immersion topcoat materials with improved performance Grant 7,855,045 - Allen , et al. December 21, 2	2010-12-21
Method for patterning a low activation energy photoresist Grant 7,820,369 - Allen , et al. October 26, 2	2010-10-26
Polyamide Membranes With Fluoroalcohol Functionality App 20100216899 - Allen; Robert David ; et al.	2010-08-26
Interfacial Polymerization Methods For Making Fluoroalcohol-containing Polyamides App 20100216967 - Allen; Robert David ; et al.	2010-08-26
Low activation energy dissolution modification agents for photoresist applications Grant 7,759,044 - Allen , et al. July 20, 2	2010-07-20
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,563,558 - Allen , et al. July 21, 2	2009-07-21
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Grant 7,550,254 - Sooriyakumaran , et al. June 23, 2	2009-06-23
Low activation energy photoresist composition and process for its use Grant 7,476,492 - Allen , et al. January 13, 2	2009-01-13
Photoresist Topcoat For A Photolithographic Process App 20090011377 - Allen; Robert David ; et al.	2009-01-08
Imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 7,468,330 - Allen , et al. December 23, 2	2008-12-23
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules App 20080233517 - Allen; Robert David ; et al.	2008-09-25
Photoresist Topcoat For A Photolithographic Process App 20080227028 - Allen; Robert David ; et al.	2008-09-18
Photoresist topcoat for a photolithographic process Grant 7,399,581 - Allen , et al. July 15, 2	2008-07-15
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials App 20080166871 - Allen; Robert David ; et al.	2008-07-10
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,393,624 - Allen , et al. July 1, 2	2008-07-01
Low Activation Energy Dissolution Modification Agents For Photoresist Applications App 20080153034 - Allen; Robert David ; et al.	2008-06-26
Low activation energy dissolution modification agents for photoresist applications Grant 7,358,029 - Allen , et al. April 15, 2	2008-04-15
Immersion Topcoat Materials With Improved Performance App 20080026330 - Allen; Robert David ; et al.	2008-01-31
Low activation energy photoresist composition and process for its use App 20070275324 - Allen; Robert David ; et al.	2007-11-29
Negative resists based on a acid-catalyzed elimination of polar molecules Grant 7,300,739 - Allen , et al. November 27, 2	2007-11-27
Negative resists based on acid-catalyzed elimination of polar molecules App 20070259274 - Allen; Robert David ; et al.	2007-11-08
Self-topcoating Resist For Photolithography App 20070254235 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
High Contact Angle Topcoat Material And Use Thereof In Lithography Process App 20070254236 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Topcoat Material And Use Thereof In Immersion Lithography Processes App 20070254237 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Immersion topcoat materials with improved performance Grant 7,288,362 - Allen , et al. October 30, 2	2007-10-30
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials App 20070238317 - Allen; Robert David ; et al.	2007-10-11
Low activation energy dissolution modification agents for photoresist applications App 20070231734 - Allen; Robert David ; et al.	2007-10-04
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions App 20070202440 - Sooriyakumaran; Ratnam ; et al.	2007-08-30
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Grant 7,261,992 - Sooriyakumaran , et al. August 28, 2	2007-08-28
Low activation energy photoresists Grant 7,193,023 - Allen , et al. March 20, 2	2007-03-20
Negative Resists Based On A Acid-catalyzed Elimination Of Polar Molecules App 20070026339 - Allen; Robert David ; et al.	2007-02-01
Molecular photoresists containing nonpolymeric silsesquioxanes Grant 7,141,692 - Allen , et al. November 28, 2	2006-11-28
Photoresist composition Grant 7,135,595 - Allen , et al. November 14, 2	2006-11-14
Immersion topcoat materials with improved performance App 20060188804 - Allen; Robert David ; et al.	2006-08-24
Photoresist topcoat for a photolithographic process App 20060189779 - Allen; Robert David ; et al.	2006-08-24
photoresist composition App 20060128914 - Allen; Robert David ; et al.	2006-06-15
Photoresist composition Grant 7,014,980 - Allen , et al. March 21, 2	2006-03-21
Low activation energy photoresists App 20050124774 - Allen, Robert David ; et al.	2005-06-09
Method for patterning a low activation energy photoresist App 20050123852 - Allen, Robert David ; et al.	2005-06-09
Molecular photoresists containing nonpolymeric silsesquioxanes App 20050112382 - Allen, Robert David ; et al.	2005-05-26
Photoresist composition App 20050019696 - Allen, Robert David ; et al.	2005-01-27
Photoresist composition Grant 6,806,026 - Allen , et al. October 19, 2	2004-10-19
Modified polycyclic polymers Grant 6,794,459 - Jayaraman , et al. September 21, 2	2004-09-21
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups Grant 6,723,486 - Goodall , et al. April 20, 2	2004-04-20
Photoresist composition App 20030224283 - Allen, Robert David ; et al.	2003-12-04
Process for using bilayer photoresist Grant RE38,282 - Allen , et al. October 21, 2	2003-10-21
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions Grant 6,610,456 - Allen , et al. August 26, 2	2003-08-26
Modified polycyclic polymers App 20030018153 - Jayaraman, Saikumar ; et al.	2003-01-23
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions App 20020164538 - Allen, Robert David ; et al.	2002-11-07
Modified polycyclic polymers Grant 6,451,945 - Jayaraman , et al. September 17, 2	2002-09-17
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups App 20020128408 - Goodall, Brian L. ; et al.	2002-09-12
Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications App 20020090572 - Sooriyakumaran, Ratnam ; et al.	2002-07-11
Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications App 20020081520 - Sooriyakumaran, Ratnam ; et al.	2002-06-27
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits Grant 6,165,678 - Allen , et al. December 26, 2	2000-12-26
Polycyclic resist compositions with increased etch resistance Grant 6,147,177 - Jayaraman , et al. November 14, 2	2000-11-14
Actively controlled thermal panel and method therefor Grant 6,003,817 - Basuthakur , et al. December 21, 1	1999-12-21
Process for using bilayer photoresist Grant 5,985,524 - Allen , et al. November 16, 1	1999-11-16
Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent Grant 5,962,184 - Allen , et al. October 5, 1	1999-10-05
Active spacecraft thermal control system and method Grant 5,954,298 - Basuthakur , et al. September 21, 1	1999-09-21
Process for use of photoresist composition with deep ultraviolet radiation Grant 5,786,131 - Allen , et al. July 28, 1	1998-07-28
Process for generating negative tone resist images utilizing carbon dioxide critical fluid Grant 5,665,527 - Allen , et al. September 9, 1	1997-09-09

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