Alford; Frank

Patent Applications and Registrations

Patent applications and USPTO patent grants for Alford; Frank.The latest application filed is for "angular extrusion of copper alloy anodes".

Company Profile

0.4.8

Alford; Frank - Spokane Valley WA
Alford; Frank - Veradale WA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Angular Extrusion Of Copper Alloy Anodes App 20120155501 - Ferrasse; Stephane ; et al.	2012-06-21
Target assemblies, targets, backing plates, and methods of target cooling Grant 7,691,240 - Hort , et al. April 6, 2	2010-04-06
High-strength mechanical and structural components, and methods of making high-strength components App 20070084527 - Ferrasse; Stephane ; et al.	2007-04-19
Target assemblies, targets, backing plates, and methods of target cooling App 20060260936 - Hort; Werner H. ; et al.	2006-11-23
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions Grant 7,017,382 - Segal , et al. March 28, 2	2006-03-28
Physical vapor deposition targets, and methods of fabricating metallic materials Grant 6,946,039 - Segal , et al. September 20, 2	2005-09-20
Methods of fabricating metallic materials Grant 6,908,517 - Segal , et al. June 21, 2	2005-06-21
Thin films and methods of forming thin films utilizing ECAE-targets App 20040256218 - Glass, Howard L. ; et al.	2004-12-23
Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method App 20030052000 - Segal, Vladimir ; et al.	2003-03-20
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions App 20020174916 - Segal, Vladimir M. ; et al.	2002-11-28
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions App 20020174917 - Segal, Vladimir M. ; et al.	2002-11-28
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions App 20010047838 - Segal, Vladimir M. ; et al.	2001-12-06

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