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Patent applications and USPTO patent grants for Albelo; Jeffrey A.The latest application filed is for "apparatus and method for beam scanner".
Patent | Date |
---|---|
Apparatus and method for beam scanner Grant 11,449,069 - Albelo September 20, 2 | 2022-09-20 |
Apparatus and Method for Beam Scanner App 20200081449 - Albelo; Jeffrey A | 2020-03-12 |
Ultrashort laser pulse wafer scribing Grant 9,221,124 - Albelo , et al. December 29, 2 | 2015-12-29 |
Ultrashort Laser Pulse Wafer Scribing App 20140091069 - Albelo; Jeffrey A. ;   et al. | 2014-04-03 |
Ultrashort laser pulse wafer scribing Grant 8,624,157 - Albelo , et al. January 7, 2 | 2014-01-07 |
Ultrashort laser pulse wafer scribing App 20070272668 - Albelo; Jeffrey A. ;   et al. | 2007-11-29 |
Method of increasing the shelf life of a photomask substrate Grant 7,135,256 - Montgomery , et al. November 14, 2 | 2006-11-14 |
Method of increasing the shelf life of a blank photomask substrate Grant 6,998,206 - Fuller , et al. February 14, 2 | 2006-02-14 |
Method of increasing the shelf life of a photomask substrate App 20050191562 - Montgomery, Melvin Warren ;   et al. | 2005-09-01 |
Method of increasing the shelf life of a blank photomask substrate App 20040146790 - Fuller, Scott ;   et al. | 2004-07-29 |
Method of preparing optically imaged high performance photomasks Grant 6,703,169 - Fuller , et al. March 9, 2 | 2004-03-09 |
Organic bottom antireflective coating for high performance mask making using optical imaging Grant 6,605,394 - Montgomery , et al. August 12, 2 | 2003-08-12 |
Method of preparing optically imaged high performance photomasks App 20030027083 - Fuller, Scott ;   et al. | 2003-02-06 |
Organic bottom antireflective coating for high performance mask making using optical imaging App 20020182514 - Montgomery, Melvin W. ;   et al. | 2002-12-05 |
Photoresist topcoat for deep ultraviolet (DUV) direct write laser mask fabrication App 20020071995 - Montgomery, Melvin Warren ;   et al. | 2002-06-13 |
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