Albano; Ralph
Patent Applications and Registrations
Patent applications and USPTO patent grants for Albano; Ralph.The latest application filed is for "fluorine-free plasma curing process for porous low-k materials".
- Albano; Ralph - Columbia MD
| Patent | Date |
|---|---|
| Fluorine-free plasma curing process for porous low-k materials Grant 7,011,868 - Waldfried , et al. March 14, 2 | 2006-03-14 |
| Plasma curing process for porous low-k materials Grant 6,913,796 - Albano , et al. July 5, 2 | 2005-07-05 |
| Plasma curing of MSQ-based porous low-k film materials Grant 6,759,098 - Han , et al. July 6, 2 | 2004-07-06 |
| Fluorine-free plasma curing process for porous low-k materials App 20040028916 - Waldfried, Carlo ; et al. | 2004-02-12 |
| Fluorine-free plasma curing process for porous low-k materials App 20030157267 - Waldfried, Carlo ; et al. | 2003-08-21 |
| Ultraviolet curing process for porous low-K materials App 20030054115 - Albano, Ralph ; et al. | 2003-03-20 |
| Plasma curing process for porous low-k materials App 20020106500 - Albano, Ralph ; et al. | 2002-08-08 |
| Plasma curing of MSQ-based porous low-k film materials App 20020102413 - Han, Qingyuan ; et al. | 2002-08-01 |
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