Akagi; Tetsuro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Akagi; Tetsuro.The latest application filed is for "method for predicting precipitation behavior of oxygen in silicon single crystal, method for determining production parameter of silicon single crystal, and storage medium for storing program for predicting precipitation behavior of oxygen in silicon single crystal".
- Akagi; Tetsuro - Kanagawa JP
- Akagi; Tetsuro - Hiratsuka JP
| Patent | Date |
|---|---|
| Method for predicting precipitation behavior of oxygen in silicon single crystal, method for determining production parameter of silicon single crystal, and storage medium for storing program for predicting precipitation behavior of oxygen in silicon single crystal Grant 8,246,744 - Nakamura , et al. August 21, 2 | 2012-08-21 |
| Method for predicting precipitation behavior of oxygen in silicon single crystal, method for determining production parameter of silicon single crystal, and storage medium for storing program for predicting precipitation behavior of oxygen in silicon single crystal App 20090210166 - Nakamura; Kozo ; et al. | 2009-08-20 |
| Semiconductor wafer heat treatment method Grant 5,385,115 - Tomioka , et al. January 31, 1 | 1995-01-31 |
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