Akagawa; Hiroyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Akagawa; Hiroyuki.The latest application filed is for "mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method".

Company Profile

0.7.7

Akagawa; Hiroyuki - Tokyo JP
Akagawa; Hiroyuki - Shinjuku-ku JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method Grant 8,318,388 - Suzuki , et al. November 27, 2	2012-11-27
Mask Blank Providing System, Mask Blank Providing Method, Mask Blank Transparent Substrate Manufacturing Method, Mask Blank Manufacturing Method, And Mask Manufacturing Method App 20110262847 - SUZUKI; Osamu ; et al.	2011-10-27
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method Grant 7,998,644 - Suzuki , et al. August 16, 2	2011-08-16
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method Grant 7,892,708 - Tanabe , et al. February 22, 2	2011-02-22
Mask Blank Substrate, Mask Blank, Exposure Mask, Mask Blank Substrate Manufacturing Method, And Semiconductor Manufacturing Method App 20100248092 - TANABE; Masaru ; et al.	2010-09-30
Mask Blank Providing System, Mask Blank Providing Method, Mask Blank Transparent Substrate Manufacturing Method, Mask Blank Manufacturing Method, And Mask Manufacturing Method App 20100173232 - SUZUKI; Osamu ; et al.	2010-07-08
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method Grant 7,745,074 - Tanabe , et al. June 29, 2	2010-06-29
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method Grant 7,700,244 - Suzuki , et al. April 20, 2	2010-04-20
Mask Blank Substrate, Mask Blank, Exposure Mask, Mask Blank Substrate Manufacturing Method, And Semiconductor Manufacturing Method App 20100035164 - TANABE; Masaru ; et al.	2010-02-11
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method Grant 7,592,104 - Tanabe , et al. September 22, 2	2009-09-22
Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank Grant 7,579,120 - Akagawa August 25, 2	2009-08-25
Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank App 20060223224 - Akagawa; Hiroyuki	2006-10-05
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method App 20060159931 - Suzuki; Osamu ; et al.	2006-07-20
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method App 20060068300 - Tanabe; Masaru ; et al.	2006-03-30

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