Ahn; Sang H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ahn; Sang H..The latest application filed is for "multi-stage curing of low k nano-porous films".

Company Profile

0.10.11

Ahn; Sang H. - Foster City CA
Ahn; Sang H. - Foster Cuty CA
Ahn; Sang H. - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes Grant 8,211,626 - Ahn , et al. July 3, 2	2012-07-03
Reduction in photoresist footing undercut during development of feature sizes of 120NM or less Grant 8,088,563 - Ahn , et al. January 3, 2	2012-01-03
Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes Grant 7,718,081 - Liu , et al. May 18, 2	2010-05-18
Multi-stage curing of low K nano-porous films Grant 7,611,996 - Schmitt , et al. November 3, 2	2009-11-03
Techniques promoting adhesion of porous low K film to underlying barrier layer Grant 7,547,643 - Schmitt , et al. June 16, 2	2009-06-16
Multi-stage Curing Of Low K Nano-porous Films App 20080099920 - Schmitt; Francimar ; et al.	2008-05-01
Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers Grant 7,297,376 - Yim , et al. November 20, 2	2007-11-20
Maintenance of photoresist adhesion on the surface of dielectric arcs for 90 NM feature sizes App 20070154851 - Ahn; Sang H. ; et al.	2007-07-05
Method to improve the ashing/wet etch damage resistance and integration stability of low dielectric constant films App 20070134435 - Ahn; Sang H. ; et al.	2007-06-14
Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes App 20070117050 - Ahn; Sang H. ; et al.	2007-05-24
Techniques For The Use Of Amorphous Carbon (apf) For Various Etch And Litho Integration Schemes App 20060231524 - Liu; Wei ; et al.	2006-10-19
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 7,105,460 - Kim , et al. September 12, 2	2006-09-12
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme Grant 7,064,078 - Liu , et al. June 20, 2	2006-06-20
Multi-stage curing of low K nano-porous films App 20050230834 - Schmitt, Francimar ; et al.	2005-10-20
Techniques promoting adhesion of porous low K film to underlying barrier layer App 20050233591 - Schmitt, Francimar ; et al.	2005-10-20
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 6,927,178 - Kim , et al. August 9, 2	2005-08-09
Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme App 20050167394 - liu, Wei ; et al.	2005-08-04
Maintenance of photoresist adhesion and activity on the surface of dielectric ARCS for 90 nm feature sizes App 20050118541 - Ahn, Sang H. ; et al.	2005-06-02
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040214446 - Kim, Bok Hoen ; et al.	2004-10-28
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040009676 - Kim, Bok Hoen ; et al.	2004-01-15
Method of forming a silicon nitride layer on a substrate Grant 6,559,074 - Chen , et al. May 6, 2	2003-05-06

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