Ahn; Jaein

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ahn; Jaein.The latest application filed is for "polishing pad and method for preparing semiconductor device using the same".

Company Profile

11.4.14

Ahn; Jaein - Gyeonggi-do KR
AHN; Jaein - Seongnam-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Leakage-proof polishing pad and process for preparing the same Grant 11,267,098 - Yun , et al. March 8, 2	2022-03-08
Polishing Pad And Method For Preparing Semiconductor Device Using The Same App 20220059401 - YUN; Jong Wook ; et al.	2022-02-24
Polishing Pad Having Excellent Airtightness App 20210291314 - YUN; Sunghoon ; et al.	2021-09-23
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same App 20210162560 - AHN; Jaein ; et al.	2021-06-03
Polishing Pad, Preparation Method Thereof, And Preparation Method Of Semiconductor Device Using Same App 20210154797 - HEO; Hyeyoung ; et al.	2021-05-27
Polishing pad that minimizes occurrence of defects and process for preparing the same Grant 11,000,935 - Yun , et al. May 11, 2	2021-05-11
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad App 20210094143 - AHN; Jaein ; et al.	2021-04-01
Polishing Pad, Method For Manufacturing Polishing Pad, And Polishing Method Applying Polishing Pad App 20210094144 - AHN; Jaein ; et al.	2021-04-01
Polishing Pad That Minimizes Occurrence Of Defects And Process For Preparing The Same App 20200306921 - YUN; Sunghoon ; et al.	2020-10-01
Polishing Pad Comprising Window Similar In Hardness To Polishing Layer App 20200164483 - YUN; Sunghoon ; et al.	2020-05-28
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same Grant 10,518,383 - Ahn , et al. Dec	2019-12-31
Polishing Pad With Improved Fluidity Of Slurry And Process For Preparing Same App 20190389033 - YUN; Sunghoon ; et al.	2019-12-26
Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same Grant 10,513,007 - Ahn , et al. Dec	2019-12-24
Porous Polyurethane Polishing Pad And Process For Producing The Same App 20190321937 - HEO; Hye Young ; et al.	2019-10-24
Porous Polishing Pad And Process For Producing The Same App 20190314954 - HEO; Hye Young ; et al.	2019-10-17
Leakage-proof Polishing Pad And Process For Preparing The Same App 20190111542 - YUN; Sunghoon ; et al.	2019-04-18
Porous Polyurethane Polishing Pad And Process For Preparing A Semiconductor Device By Using The Same App 20180339393 - AHN; Jaein ; et al.	2018-11-29
Porous Polyurethane Polishing Pad And Process For Preparing A Semiconductor Device By Using The Same App 20180339394 - AHN; Jaein ; et al.	2018-11-29

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