Agarwal; Rajiv Krishan
Patent Applications and Registrations
Patent applications and USPTO patent grants for Agarwal; Rajiv Krishan.The latest application filed is for "tin hard mask and etch residue removal".
- Agarwal; Rajiv Krishan - Malvern PA
| Patent | Date |
|---|---|
| TiN hard mask and etch residue removal Grant 10,711,227 - Liu , et al. | 2020-07-14 |
| Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation Grant 10,073,351 - Agarwal , et al. September 11, 2 | 2018-09-11 |
| TiN Hard Mask and Etch Residue Removal App 20180251711 - Liu; Wen Dar ; et al. | 2018-09-06 |
| TiN hard mask and etch residual removal Grant 9,976,111 - Liu , et al. May 22, 2 | 2018-05-22 |
| TiN Hard Mask And Etch Residual Removal App 20170107460 - Liu; Wen Dar ; et al. | 2017-04-20 |
| Process for making trisilylamine Grant 9,463,978 - Agarwal , et al. October 11, 2 | 2016-10-11 |
| Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation App 20160179011 - Agarwal; Rajiv Krishan ; et al. | 2016-06-23 |
| Process For Making Trisilylamine App 20160145102 - Agarwal; Rajiv Krishan ; et al. | 2016-05-26 |
| Process for making trisilylamine Grant 9,284,198 - Agarwal , et al. March 15, 2 | 2016-03-15 |
| Process For Making Trisilylamine App 20150004089 - Agarwal; Rajiv Krishan ; et al. | 2015-01-01 |
| System And Method For Tungsten Hexafluoride Recovery And Reuse App 20140196664 - Johnson; Andrew David ; et al. | 2014-07-17 |
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