loadpatents
name:-0.0029239654541016
name:-0.012943029403687
name:-0.00054097175598145
Adem; Ercan Patent Filings

Adem; Ercan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Adem; Ercan.The latest application filed is for "preamorphization to minimize void formation".

Company Profile
0.12.2
  • Adem; Ercan - Sunnyvale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Thin film germanium diode with low reverse breakdown
Grant 7,468,296 - Adem , et al. December 23, 2
2008-12-23
Preamorphization to minimize void formation
Grant 7,361,586 - Adem , et al. April 22, 2
2008-04-22
Preamorphization to minimize void formation
App 20070020919 - Adem; Ercan ;   et al.
2007-01-25
Method of ultra-low energy ion implantation to form alloy layers in copper
Grant 7,115,498 - Adem October 3, 2
2006-10-03
Method of forming a selective barrier layer using a sacrificial layer
Grant 6,869,878 - Adem , et al. March 22, 2
2005-03-22
Method of forming wiring by implantation of seed layer material
Grant 6,770,559 - Adem , et al. August 3, 2
2004-08-03
Method of in situ monitoring of thickness and composition of deposited films using raman spectroscopy
Grant 6,667,070 - Adem December 23, 2
2003-12-23
Method and apparatus for determining an etch endpoint
Grant 6,641,747 - Lukanc , et al. November 4, 2
2003-11-04
Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing
Grant 6,605,513 - Paton , et al. August 12, 2
2003-08-12
Process for forming fully silicided gates
Grant 6,562,718 - Xiang , et al. May 13, 2
2003-05-13
HDP treatment for reduced nickel silicide bridging
Grant 6,521,529 - Ngo , et al. February 18, 2
2003-02-18
Method Of Forming Nickel Silicide Using A One-step Rapid Thermal Anneal Process And Backend Processing
App 20020068408 - Paton, Eric N. ;   et al.
2002-06-06
Gate stack structure for variable threshold voltage
Grant 6,281,559 - Yu , et al. August 28, 2
2001-08-28
Semiconductor device having a low dielectric constant material
Grant 6,208,030 - Tsui , et al. March 27, 2
2001-03-27

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