loadpatents
name:-0.025046110153198
name:-0.027332067489624
name:-0.0029990673065186
ACKMANN; Paul Patent Filings

ACKMANN; Paul

Patent Applications and Registrations

Patent applications and USPTO patent grants for ACKMANN; Paul.The latest application filed is for "gap fill void and connection structures".

Company Profile
2.28.29
  • ACKMANN; Paul - Gansevoort NY
  • Ackmann; Paul - Ganesvoort NY
  • Ackmann; Paul - Buda TX
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Gap Fill Void And Connection Structures
App 20210134658 - HUANG; Haigou ;   et al.
2021-05-06
Gap fill void and connection structures
Grant 10,923,388 - Huang , et al. February 16, 2
2021-02-16
Gap Fill Void And Connection Structures
App 20200235002 - HUANG; Haigou ;   et al.
2020-07-23
Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device
Grant 10,002,827 - Ning , et al. June 19, 2
2018-06-19
Metrology pattern layout and method of use thereof
Grant 9,864,831 - Ning , et al. January 9, 2
2018-01-09
Method wherein test cells and dummy cells are included into a layout of an integrated circuit
Grant 9,817,940 - Ueberreiter , et al. November 14, 2
2017-11-14
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques
Grant 9,798,238 - Ning , et al. October 24, 2
2017-10-24
Monitoring pattern for devices
Grant 9,791,772 - Ning , et al. October 17, 2
2017-10-17
Method Wherein Test Cells And Dummy Cells Are Included Into A Layout Of An Integrated Circuit
App 20170235866 - Ueberreiter; Guido ;   et al.
2017-08-17
Method For Selective Re-routing Of Selected Areas In A Target Layer And In Adjacent Interconnecting Layers Of An Ic Device
App 20170186687 - NING; Guoxiang ;   et al.
2017-06-29
Method for selective re-routing of selected areas in a target layer and in adjacent interconnecting layers of an IC device
Grant 9,672,313 - Ning , et al. June 6, 2
2017-06-06
Method wherein test cells and dummy cells are included into a layout of an integrated circuit
Grant 9,672,312 - Ueberreiter , et al. June 6, 2
2017-06-06
Semiconductor device resolution enhancement by etching multiple sides of a mask
Grant 9,658,531 - Ning , et al. May 23, 2
2017-05-23
Multiple threshold convergent OPC model
Grant 9,645,486 - Lim , et al. May 9, 2
2017-05-09
Reticle, system comprising a plurality of reticles and method for the formation thereof
Grant 9,535,319 - Ueberreiter , et al. January 3, 2
2017-01-03
Pattern Classification Based Proximity Corrections For Reticle Fabrication
App 20160363853 - NING; Guoxiang ;   et al.
2016-12-15
Pattern classification based proximity corrections for reticle fabrication
Grant 9,500,945 - Ning , et al. November 22, 2
2016-11-22
Method Wherein Test Cells And Dummy Cells Are Included Into A Layout Of An Integrated Circuit
App 20160328510 - Ueberreiter; Guido ;   et al.
2016-11-10
Method For Selective Re-routing Of Selected Areas In A Target Layer And In Adjacent Interconnecting Layers Of An Ic Device
App 20160328511 - NING; Guoxiang ;   et al.
2016-11-10
Reticle, System Comprising A Plurality Of Reticles And Method For The Formation Thereof
App 20160291457 - Ueberreiter; Guido ;   et al.
2016-10-06
Metrology Pattern Layout And Method Of Use Thereof
App 20160196381 - NING; Guoxiang ;   et al.
2016-07-07
Mask error compensation by optical modeling calibration
Grant 9,384,318 - Ning , et al. July 5, 2
2016-07-05
Cross Technology Reticle (ctr) Or Multi-layer Reticle (mlr) Cdu, Registration, And Overlay Techniques
App 20160179006 - NING; Guo Xiang ;   et al.
2016-06-23
Overlay mark dependent dummy fill to mitigate gate height variation
Grant 9,368,453 - Ning , et al. June 14, 2
2016-06-14
Multiple Threshold Convergent Opc Model
App 20160161840 - LIM; Chin Teong ;   et al.
2016-06-09
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques
Grant 9,341,961 - Ning , et al. May 17, 2
2016-05-17
Metrology pattern layout and method of use thereof
Grant 9,323,882 - Ning , et al. April 26, 2
2016-04-26
Overlay Mark Dependent Dummy Fill To Mitigate Gate Height Variation
App 20160079180 - NING; Guoxiang ;   et al.
2016-03-17
Efficient optical proximity correction repair flow method and apparatus
Grant 9,250,538 - Ning , et al. February 2, 2
2016-02-02
Overlay mark dependent dummy fill to mitigate gate height variation
Grant 9,252,061 - Ning , et al. February 2, 2
2016-02-02
Customized alleviation of stresses generated by through-substrate via(S)
Grant 9,236,301 - Ning , et al. January 12, 2
2016-01-12
Mask Error Compensation By Optical Modeling Calibration
App 20150310157 - NING; Guoxiang ;   et al.
2015-10-29
Overlay Mark Dependent Dummy Fill To Mitigate Gate Height Variation
App 20150287651 - NING; Guoxiang ;   et al.
2015-10-08
Metrology Pattern Layout And Method Of Use Thereof
App 20150278426 - NING; Guoxiang ;   et al.
2015-10-01
Forming alignment mark and resulting mark
Grant 9,136,223 - Ning , et al. September 15, 2
2015-09-15
Layout For Reticle And Wafer Scanning Electron Microscope Registration Or Overlay Measurements
App 20150221565 - NING; Guo Xiang ;   et al.
2015-08-06
Efficient Optical Proximity Correction Repair Flow Method And Apparatus
App 20150192866 - NING; Guoxiang ;   et al.
2015-07-09
Layout for reticle and wafer scanning electron microscope registration or overlay measurements
Grant 9,029,855 - Ning , et al. May 12, 2
2015-05-12
Device Layout For Reducing Through-silicon-via Stress
App 20150028482 - Ning; Guoxiang ;   et al.
2015-01-29
Forming Alignment Mark And Resulting Mark
App 20150028500 - NING; Guoxiang ;   et al.
2015-01-29
Customized Alleviation Of Stresses Generated By Through-substrate Via(s)
App 20150017803 - NING; Guoxiang ;   et al.
2015-01-15
Optical Proximity Correction For Connecting Via Between Layers Of A Device
App 20150006138 - Ning; Guo Xiang ;   et al.
2015-01-01
Semiconductor Device Resolution Enhancement By Etching Multiple Sides Of A Mask
App 20140370447 - NING; Guoxiang ;   et al.
2014-12-18
Circuit structures and methods of fabrication with enhanced contact via electrical connection
Grant 8,907,496 - Ning , et al. December 9, 2
2014-12-09
Circuit Structures And Methods Of Fabrication With Enhanced Contact Via Electrical Connection
App 20140353843 - NING; GuoXiang ;   et al.
2014-12-04
Semiconductor device resolution enhancement by etching multiple sides of a mask
Grant 8,895,211 - Ning , et al. November 25, 2
2014-11-25
Cross Technology Reticle (ctr) Or Multi-layer Reticle (mlr) Cdu, Registration, And Overlay Techniques
App 20140268090 - NING; Guo Xiang ;   et al.
2014-09-18
Monitoring Pattern For Devices
App 20140273310 - NING; Guoxiang ;   et al.
2014-09-18
Layout For Reticle And Wafer Scanning Electron Microscope Registration Or Overlay Measurements
App 20140264334 - NING; Guo Xiang ;   et al.
2014-09-18
Semiconductor Device Resolution Enhancement By Etching Multiple Sides Of A Mask
App 20140162176 - NING; Guoxiang ;   et al.
2014-06-12
Method and apparatus for programmed latency for improving wafer-to-wafer uniformity
Grant 6,405,144 - Toprac , et al. June 11, 2
2002-06-11
Automated data management system for analysis and control of photolithography stepper performance
Grant 5,757,673 - Osheiski , et al. May 26, 1
1998-05-26
Automated data management system for analysis and control of photolithography stepper performance
Grant 5,586,059 - Oshelski , et al. December 17, 1
1996-12-17

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed