Achutharaman; Vedapuram S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Achutharaman; Vedapuram S..The latest application filed is for "minimization of ring erosion during plasma processes".

Company Profile

1.14.15

Achutharaman; Vedapuram S. - Saratoga CA
Achutharaman; Vedapuram S. - San Jose CA
ACHUTHARAMAN, VEDAPURAM S. - SANTA CLARA CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Universal process kit Grant 11,049,760 - Joubert , et al. June 29, 2	2021-06-29
Minimization Of Ring Erosion During Plasma Processes App 20190043697 - JOUBERT; Olivier ; et al.	2019-02-07
Minimization of ring erosion during plasma processes Grant 10,109,464 - Joubert , et al. October 23, 2	2018-10-23
Ion Beam Sputtering With Ion Assisted Deposition For Coatings On Chamber Components App 20180105922 - Sun; Jennifer Y. ; et al.	2018-04-19
Ion Beam Sputtering With Ion Assisted Deposition For Coatings On Chamber Components App 20180010235 - Sun; Jennifer Y. ; et al.	2018-01-11
Ion Beam Sputtering With Ion Assisted Deposition For Coatings On Chamber Components App 20180010234 - Sun; Jennifer Y. ; et al.	2018-01-11
Ion beam sputtering with ion assisted deposition for coatings on chamber components Grant 9,797,037 - Sun , et al. October 24, 2	2017-10-24
Composite edge ring Grant D797,691 - Joubert , et al. September 19, 2	2017-09-19
Universal Process Kit App 20170256435 - JOUBERT; Olivier ; et al.	2017-09-07
Ion beam sputtering with ion assisted deposition for coatings on chamber components Grant 9,725,799 - Sun , et al. August 8, 2	2017-08-08
Minimization Of Ring Erosion During Plasma Processes App 20170200588 - JOUBERT; Olivier ; et al.	2017-07-13
Ion Beam Sputtering With Ion Assisted Deposition For Coatings On Chamber Components App 20160326625 - Sun; Jennifer Y. ; et al.	2016-11-10
Ion Beam Sputtering With Ion Assisted Deposition For Coatings On Chamber Components App 20150158775 - Sun; Jennifer Y. ; et al.	2015-06-11
Fast axis beam profile shaping for high power laser diode based annealing system Grant 8,288,683 - Jennings , et al. October 16, 2	2012-10-16
Real time process monitoring and control for semiconductor junctions Grant 8,110,828 - Achutharaman , et al. February 7, 2	2012-02-07
Real Time Process Monitoring And Control For Semiconductor Junctions App 20110259391 - Achutharaman; Vedapuram S. ; et al.	2011-10-27
Real time process monitoring and control for semiconductor junctions Grant 7,964,418 - Achutharaman , et al. June 21, 2	2011-06-21
Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system Grant 7,674,999 - Jennings , et al. March 9, 2	2010-03-09
Fast axis beam profile shaping for high power laser diode based annealing system App 20090152247 - Jennings; Dean ; et al.	2009-06-18
Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system App 20080210671 - Jennings; Dean ; et al.	2008-09-04
Controlled Annealing Method App 20080090309 - RANISH; JOSEPH MICHAEL ; et al.	2008-04-17
Real time process monitoring and control for semiconductor junctions App 20080041439 - Achutharaman; Vedapuram S. ; et al.	2008-02-21
Method and apparatus for planarization of a material by growing a sacrificial film with customized thickness profile Grant 6,916,744 - Achutharaman , et al. July 12, 2	2005-07-12
Thermally matched support ring for substrate processing chamber Grant 6,888,104 - Ranish , et al. May 3, 2	2005-05-03
Method and apparatus for planarization of a material by growing a sacrificial film with customized thickness profile App 20040121598 - Achutharaman, Vedapuram S. ; et al.	2004-06-24
Method And Apparatus For Improving Film Deposition Uniformity On A Substrate App 20020020358 - HEY, H. PETER W. ; et al.	2002-02-21
Method and apparatus for improving film deposition uniformity on a substrate Grant 6,022,587 - Hey , et al. February 8, 2	2000-02-08
Method and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor deposition Grant 6,019,839 - Achutharaman , et al. February 1, 2	2000-02-01
Method of forming doped silicon in high aspect ratio openings Grant 5,863,598 - Venkatesan , et al. January 26, 1	1999-01-26

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