Abel; Joseph

Patent Applications and Registrations

Patent applications and USPTO patent grants for Abel; Joseph.The latest application filed is for "gas feed system for surface modified depth controlled deposition for plasma based deposition".

Company Profile

11.6.8

Abel; Joseph - West Linn OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Gas Feed System For Surface Modified Depth Controlled Deposition For Plasma Based Deposition App 20220301866 - Abel; Joseph ; et al.	2022-09-22
Dielectric Gapfill Using Atomic Layer Deposition (ald), Inhibitor Plasma And Etching App 20220205096 - ABEL; Joseph ; et al.	2022-06-30
Surface modified depth controlled deposition for plasma based deposition Grant 11,373,862 - Abel , et al. June 28, 2	2022-06-28
Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching Grant 11,293,098 - Abel , et al. April 5, 2	2022-04-05
Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film Grant 10,978,302 - Karim , et al. April 13, 2	2021-04-13
Surface Modified Depth Controlled Deposition For Plasma Based Deposition App 20200357636 - Abel; Joseph ; et al.	2020-11-12
Surface modified depth controlled deposition for plasma based deposition Grant 10,727,046 - Abel , et al.	2020-07-28
Method monitoring chamber drift Grant 10,636,686 - Abel , et al.	2020-04-28
Dielectric Gapfill Using Atomic Layer Deposition (ald), Inhibitor Plasma And Etching App 20200017967 - ABEL; Joseph ; et al.	2020-01-16
Surface Modified Depth Controlled Deposition For Plasma Based Deposition App 20200013616 - Abel; Joseph ; et al.	2020-01-09
Method Monitoring Chamber Drift App 20190267268 - ABEL; Joseph ; et al.	2019-08-29
Method Of Improving Deposition Induced Cd Imbalance Using Spatially Selective Ashing Of Carbon Based Film App 20190164757 - KARIM; Ishtak ; et al.	2019-05-30
Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer Grant 10,269,559 - Abel , et al.	2019-04-23
Dielectric Gapfill Of High Aspect Ratio Features Utilizing A Sacrificial Etch Cap Layer App 20190080903 - Abel; Joseph ; et al.	2019-03-14

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