Abe; Hisaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Abe; Hisaki.The latest application filed is for "resist stripping agent and process of producing semiconductor devices using the same".

Company Profile

0.7.4

Abe; Hisaki - Niigata JP
Abe; Hisaki - Niigata-ken JP
ABE, HISAKI - NIIGATA-SHI JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photoresist stripping composition and process for stripping resist Grant 6,815,150 - Nakahara , et al. November 9, 2	2004-11-09
Cleaning agent and cleaning process using the same Grant 6,686,322 - Nohara , et al. February 3, 2	2004-02-03
Resist stripping agent and process of producing semiconductor devices using the same Grant 6,638,694 - Ikemoto , et al. October 28, 2	2003-10-28
Resist Stripping Agent And Process Of Producing Semiconductor Devices Using The Same App 20030186175 - Ikemoto, Kazuto ; et al.	2003-10-02
Photoresist stripping composition and process for stripping resist App 20030152874 - Nakahara, Hijiri ; et al.	2003-08-14
Photoresist stripping composition and process for stripping photoresist Grant 6,458,517 - Nohara , et al. October 1, 2	2002-10-01
Photoresist removing composition Grant 6,440,326 - Maruyama , et al. August 27, 2	2002-08-27
Photoresist stripping composition and process for stripping photoresist App 20020009674 - Nohara, Masahiro ; et al.	2002-01-24
Resist Film Removing Composition And Method For Manufacturing Thin Film Circuit Element Using The Composition App 20010013502 - NOHARA, MASAHIRO ; et al.	2001-08-16
Active carbon materials, process for the preparation thereof and the use thereof Grant 5,338,462 - Abe , et al. August 16, 1	1994-08-16
Active carbon materials, process for the preparation thereof and the use thereof Grant 5,242,879 - Abe , et al. September 7, 1	1993-09-07

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