PTNM

Thorlabs, Inc.

Application Filed: 2019-06-20
Trademark Application Details
Trademark Logo PTNM

Mark For: PTNM™ trademark registration is intended to cover the category of custom manufacture of photolithographic masks. [all]

Status

2020-04-06 UTC
LIVE APPLICATION Under Examination
The trademark application has been accepted by the Office (has met the minimum filing requirements) and that this application has been assigned to an examiner.


Research OneLook Acronym Finder
Serial Number88481436
Mark Literal ElementsPTNM
Mark Drawing Type4 - STANDARD CHARACTER MARK
Mark TypeSERVICE MARK
RegisterPRINCIPAL
Current LocationTMO LAW OFFICE 119 - EXAMINING ATTORNEY ASSIGNED 2019-09-04
Basis1(a)
Class StatusACTIVE
Primary US Classes
  • 100: Miscellaneous
  • 103: Construction and Repair
  • 106: Material Treatment
Primary International Class
  • 040 - Primary Class
  • (Treatment of materials) Treatment of materials.
Filed UseYes
Current UseYes
Intent To UseNo
Filed ITUNo
44D FiledNo
44E CurrentNo
66A CurrentNo
Current BasisNo
No BasisNo
Attorney NameHarris A. Wolin
Attorney Docket NumberCIRT 9160
Law Office AssignedN10
Employee NameZAK, HENRY S

Timeline

2012-12-00Date of First Use
2012-12-01Date of First Use
2012-12-01Date of Use In Commerce
2019-06-20Application Filed
2019-09-04Location: TMO LAW OFFICE 119 - EXAMINING ATTORNEY ASSIGNED
2019-09-04Status: Live/Pending
2019-09-04Transaction Date
2020-03-04Status: Applicant's response to a non-final Office action has been entered. The application is being returned to the examining attorney

Trademark Parties (Applicants & Owners)

Party: Thorlabs, Inc.
Address56 Sparta Avenue Newton, NEW JERSEY UNITED STATES 07860
Legal Entity TypeCorporation
Legal Entity StateNEW JERSEY

Documents

SpecimenJPEG2019-06-20
Offc Action OutgoingXML2019-09-04
XSearch Search SummaryXML2019-09-04

Attorney of Record

HARRIS A. WOLIN
MYERS WOLIN, LLC
100 HEADQUARTERS PLAZA
WEST TOWER, FLOOR 7
MORRISTOWN, NJ 07960

Good, Services, and Codes


IC 040. US 100 103 106. G & S: Custom manufacture of photolithographic masks. FIRST USE: 20121200. FIRST USE IN COMMERCE: 20121200

International Codes:40
U.S. Codes:100,103,106
International Codes:42
U.S. Codes:100,101
Type CodeType
GS0421nanomanufacturing process for creating customized photolithographic masks

Trademark Filing History

DescriptionDateProceeding Number
TEAS/EMAIL CORRESPONDENCE ENTERED2020-03-0488889
TEAS RESPONSE TO OFFICE ACTION RECEIVED2020-03-03
CORRESPONDENCE RECEIVED IN LAW OFFICE2020-03-0388889
ASSIGNED TO EXAMINER2020-03-0282415
NOTIFICATION OF NON-FINAL ACTION E-MAILED2019-09-046325
NON-FINAL ACTION WRITTEN2019-09-0462126
NON-FINAL ACTION E-MAILED2019-09-046325
ASSIGNED TO EXAMINER2019-08-3062126
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM2019-06-30
NEW APPLICATION ENTERED IN TRAM2019-06-24

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