Response to Office Action

Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1957 (Rev 10/2011)

OMB No. 0651-0050 (Exp 09/20/2020)

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Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1957 (Rev 10/2011)

OMB No. 0651-0050 (Exp 09/20/2020)

Response to Office Action

To the Commissioner for Trademarks:

Application serial no. 88179554 PRISMO HIT3 (Stylized and/or with Design, see http://uspto.report/TM/88179554/mark.png) has been amended as follows:

CLASSIFICATION AND LISTING OF GOODS/SERVICES
Applicant proposes to amend the following class of goods/services in the application:
Current: Class 007 for plasma etching machines; liquid crystal display manufacture equipment; metal-organic chemical vapor deposition equipment; machines for manufacturing semi-conductors; flat panel display manufacture equipment; supporting frame and parts for semiconductor device manufacture; epitaxial growth and processing equipment; epitaxial growth reactor for semiconductor manufacture; chemical vapor deposition processing equipment; light emitting diode device manufacture equipment; vacuum processing reactors
Original Filing Basis:
Filing Basis: Section 1(b), Intent to Use: For a trademark or service mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to use the mark in commerce on or in connection with the identified goods/services in the application. For a collective trademark, collective service mark, or collective membership mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to exercise legitimate control over the use of the mark in commerce by members on or in connection with the identified goods/services/collective membership organization. For a certification mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to exercise legitimate control over the use of the mark in commerce by authorized users in connection with the identified goods/services, and the applicant will not engage in the production or marketing of the goods/services to which the mark is applied, except to advertise or promote recognition of the certification program or of the goods/services that meet the certification standards of the applicant.

Proposed:
Tracked Text Description: plasma etching machines; liquid crystal display manufacture equipment; metal-organic chemical vapor deposition equipment; metal-organic chemical vapor deposition equipment for LED device or power device manufacturing, typically precursor A (metal organic gas: Trimethylgallium/TMGa)+ precursor B (NH3) are fed into MOCVD equipment and react with each other to form GaN layer on the wafer, LED device is manufactured in the GaN layer; machines for manufacturing semi-conductors; flat panel display manufacture equipment; flat panel display manufacture equipment in the nature of an etching deposition apparatus; supporting frame and parts for semiconductor device manufacture; supporting frame and parts for semiconductor device manufacture, namely a platform for semiconductor processing equipment; epitaxial growth and processing equipment; epitaxial growth and processing equipment, namely susceptors and shower plates for plasma-enhanced chemical vapor deposition equipment; epitaxial growth reactor for semiconductor manufacture; semiconductor manufacturing machines, namely, epitaxial growth reactors; chemical vapor deposition processing equipment; chemical vapor deposition processing equipment, namely, equipment for forming a semiconductor or dielectric layer on the wafer; light emitting diode device manufacture equipment; light emitting diode device manufacture equipment, such as metal organic chemical vapor deposit equipment; vacuum processing reactors; semiconductor manufacturing equipment, namely vacuum processing reactorsClass 007 for plasma etching machines; liquid crystal display manufacture equipment; metal-organic chemical vapor deposition equipment for LED device or power device manufacturing, typically precursor A (metal organic gas: Trimethylgallium/TMGa)+ precursor B (NH3) are fed into MOCVD equipment and react with each other to form GaN layer on the wafer, LED device is manufactured in the GaN layer ; machines for manufacturing semi-conductors; flat panel display manufacture equipment in the nature of an etching deposition apparatus; supporting frame and parts for semiconductor device manufacture, namely a platform for semiconductor processing equipment; epitaxial growth and processing equipment, namely susceptors and shower plates for plasma-enhanced chemical vapor deposition equipment; semiconductor manufacturing machines, namely, epitaxial growth reactors; chemical vapor deposition processing equipment, namely, equipment for forming a semiconductor or dielectric layer on the wafer; light emitting diode device manufacture equipment, such as metal organic chemical vapor deposit equipment; semiconductor manufacturing equipment, namely vacuum processing reactors
Filing Basis: Section 1(b), Intent to Use: For a trademark or service mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to use the mark in commerce on or in connection with the identified goods/services in the application. For a collective trademark, collective service mark, or collective membership mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to exercise legitimate control over the use of the mark in commerce by members on or in connection with the identified goods/services/collective membership organization. For a certification mark application: As of the application filing date, the applicant had a bona fide intention, and was entitled, to exercise legitimate control over the use of the mark in commerce by authorized users in connection with the identified goods/services, and the applicant will not engage in the production or marketing of the goods/services to which the mark is applied, except to advertise or promote recognition of the certification program or of the goods/services that meet the certification standards of the applicant.

SIGNATURE(S)
Response Signature
Signature: /Douglas A. Miro, Esq./     Date: 06/26/2019
Signatory's Name: Douglas A. Miro, Esq.
Signatory's Position: attorney of record; New York State Bar member

Signatory's Phone Number: 212 336 8000

The signatory has confirmed that he/she is an attorney who is a member in good standing of the bar of the highest court of a U.S. state, which includes the District of Columbia, Puerto Rico, and other federal territories and possessions; and he/she is currently the owner's/holder's attorney or an associate thereof; and to the best of his/her knowledge, if prior to his/her appointment another U.S. attorney or a Canadian attorney/agent not currently associated with his/her company/firm previously represented the owner/holder in this matter: (1) the owner/holder has filed or is concurrently filing a signed revocation of or substitute power of attorney with the USPTO; (2) the USPTO has granted the request of the prior representative to withdraw; (3) the owner/holder has filed a power of attorney appointing him/her in this matter; or (4) the owner's/holder's appointed U.S. attorney or Canadian attorney/agent has filed a power of attorney appointing him/her as an associate attorney in this matter.

        
Serial Number: 88179554
Internet Transmission Date: Wed Jun 26 14:36:17 EDT 2019
TEAS Stamp: USPTO/ROA-XXX.XXX.XXX.XXX-20190626143617
304510-88179554-620ecf3461c294c2074d145f
4a95529801cd54f3e47b760566e85f874b511d55
55f-N/A-N/A-20190626143435170675