TEAS RF New Application

Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1478 (Rev 09/2006)

OMB No. 0651-0009 (Exp 02/28/2021)

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Under the Paperwork Reduction Act of 1995 no persons are required to respond to a collection of information unless it displays a valid OMB control number. PTO Form 1478 (Rev 09/2006)

OMB No. 0651-0009 (Exp 02/28/2021)

Trademark/Service Mark Application, Principal Register

Serial Number: 88150374

Filing Date: 10/10/2018

To the Commissioner for Trademarks:

MARK: PRO.FACE (Standard Characters, see mark)
The literal element of the mark consists of PRO.FACE.
The mark consists of standard characters, without claim to any particular font style, size, or color.

The applicant, Beauty 21 Cosmetics, Inc., a corporation of California, having an address of
      2021 S. Archibald Avenue
      Ontario, California 91761
      United States

requests registration of the trademark/service mark identified above in the United States Patent and Trademark Office on the Principal Register established by the Act of July 5, 1946 (15 U.S.C. Section 1051 et seq.), as amended, for the following:

       International Class 003:  COSMETICS AND MAKEUP PREPARATIONS

In International Class 003, the mark was first used by the applicant or the applicant's related company or licensee or predecessor in interest at least as early as 11/06/2015, and first used in commerce at least as early as 11/06/2015, and is now in use in such commerce. The applicant is submitting one(or more) specimen(s) showing the mark as used in commerce on or in connection with any item in the class of listed goods/services, consisting of a(n) Screenshot of cosmetics showing use of the mark.

Original PDF file:
SPE0-17322719124-20181010184940548280_._Specimen.pdf
Converted PDF file(s) (1 page)
Specimen File1


The applicant's current Attorney Information:
      Linda H. Liu and John B. Sganga, Jr., Edward A. Schlatter, Gerard von Hoffmann, Joseph R. Re, Catherine J. Holland, John M. Carson, Karen Vogel Weil, Andrew H. Simpson, Jeffrey L. Van Hoosear, Daniel E. Altman, Lynda J. Zadra-Symes, William H. Shreve, Stephen C. Jensen, Steven J. Nataupsky, Paul A. Stewart, Joseph F. Jennings, Craig S. Summers, Brenton R. Babcock, Diane M. Reed, Ronald J. Schoenbaum, John R. King, Adeel S. Akhtar, David N. Weiss, Douglas G. Muehlhauser, Lori Lee Yamato, Michael K. Friedland, Stacey R. Halpern, Mark M. Abumeri, Jon W. Gurka, John W. Holcomb, Joseph M. Reisman, Michael L. Fuller, Mark R. Benedict, Paul N. Conover, Robert J. Roby, Sabing H. Lee, Karoline A. Delaney, Joseph S. Cianfrani, William R. Zimmerman, Paul C. Steinhardt, Eric S. Furman, Susan M. Natland, Rose M. Thiessen, Michael A. Guiliana, Rabinder N. Narula, Bruce S. Itchkawitz, John M. Grover, Irfan A. Lateef, Amy Christensen Chun, Mark J. Gallagher, David G. Jankowski, Brian C. Horne, Payson LeMeilleur, Sheila N. Swaroop, Benjamin A. Katzenellenbogen, Andrew N. Merickel, Thomas P. Krzeminski, James F. Herkenhoff, Andrew M. Douglas, Salima A. Merani, Jonathan A. Hyman, Curtiss C. Dosier, Joseph J. Mallon, Sean M. Murray, Christy G. Lea, Perry D. Oldham, Russell M. Jeide, Zi Y. Wong, Matthew S. Bellinger, Mincheol Kim, Gregory A. Hermanson, Lauren Keller Katzenellenbogen, Ted M. Cannon, Carol Pitzel Cruz, Josué A. Villalta, Andrew I. Kimmel, Brenden Gingrich, Maria Culic Anderson, Melanie J. Seelig, Mauricio A. Uribe, Curtis R. Huffmire, Christopher L. Ross, Eli A. Loots, Ryan E. Melnick, Yanna S. Bouris, Philip M. Nelson, Marko R. Zoretic, Kerry S. Taylor, Derek C. Dailey, Jarom D. Kesler, Steven P. Ruden, Colin B. Heideman, Theodore G. Papagiannis, Nicholas M. Zovko, Adam J. Gilbert, Kimberly J. Miller, Bryan W. Wahl, Thomas Y. Yee, Michelle E. Armond, Agnes Juang, Jason J. Jardine, Jared C. Bunker, Lance D. Smemoe, Joshua J. Stowell, Scott Raevsky, Jonathan E. Bachand, Ali S. Razai, Terry K. Tullis, Derek R. Bayles, Cheryl T. Burgess, Gregory B. Phillips, Brian C. Claassen, Mark Lezama, Sean Ambrosius, Stephen W. Larson, John L. Paik, Bridget O'L. Smith, Michael R. Christensen, Benjamin J. Everton, Jason A. Gersting, Baraa Kahf, Alan G. Laquer, Jing Liu, Vlad Teplitskiy, Jeffery L. Hallstrom, Maria V. Stout, William O. Adams, Ian W. Gillies, Andrew W. Lloyd, Mark D. Kachner, Lincoln S. Essig, David R. Trossen, Aaron M. Davis, Jason R. Swartz, Benjamin B. Anger, Jason A. Champion, Daniel V. Gibson, Jeremy J. Carney, Karen M. Cassidy, Adam B. Powell, Christopher M. DiLeo, Karen J. Lenker, Bryan G. McWhorter, Nathanael R. Luman, Andrea L. Cheek, Deborah S. Shepherd, Alejandro D. Muñoz, Mark D. Marsden, Nora A. Marachelian, Joan Y. Chan, Allyson G. Brown, Damien J. Howard, Jane Q. Dai, Shannon Lam, Peter Law, Mark Metzke, Scott G. Siera, Vikas Bhargava, Daniel J. Fischer, Jacob Peterson, Christie R.W. Matthaei, Vladimir S. Lozan, Paul S. Stellman, Lauren E. Hockett, Jeremy A. Anapol, Heungsoo Choi, Scott A. Cromar, Kendall M. Loebbaka, David R. Schmidt, Harnik Shukla, Charlene A. Azema, Morgan R. Coates, Loni L. Morrow, Kyu S. Min, Jane Xia, Chang Sik Lim, Jessica L. Achtsam, Thomas S.H. Cowan, Nicole Rossi Townes, Caleb A. Bates, Devanie A. DuFour, Alexander J. Martinez, Hans L. Mayer, Jessica C. Sganga, Nicholas A. Belair, Ryan S. Furtado, Jonathan A. Menkes, Angela K. Dremann, Justin J. Gillett, M. Scott Forbes, Brian M. Graham, Brian J. Flynn, Mitchell B. Hadley, Qi Peter Tong, Elenore Niu, Michael P. Burns, Paul Chang, David M. Cohen, Mark E. Davis, Jordan E. Gottdank, Kim A. Kennedy, Daniel C. Kiang, Keith M. Lim, Ashley C. Morales, Nathan D. Reeves, Scott R. Seeley, Brandon G. Smith, Diana E. Wade, Xiaoyan Sabrina Wang, April K. White, Zach Jun Hyuk Hong, Jordan M. Cox, Albert J. Sueiras, Mark Rubinshtein, Casey D. Donahoe, David J. Grant, Clayton R. Henson, Daniel A. Kamkar, Lesley Y. Kim, Nathan J. Lee, Josepher Li, Vicki Y. Nee, Jacob R. Rosenbaum, James F. Smith, Douglas Wentzel, Thomas E. Woodland, Derek M. Abeyta, Aryeh N. Feinstein, Noorean I. Gill, Shuchen Gong, Peter A. Hecker, Aaron S. Johnson, Bryan J. Johnson, David C. Kellogg, Chanell Khosrowabadi, Lindsay A. Laddaran, Forrest M. McClellen, Janet M. Olsen, Alexander Zeng, Drew S. Hamilton, Andrew B. Schwaab, Jeremiah S. Helm, Rosaleen H. Chou, Andrew D. Lee, Yusuke Hirai, Sean S. Kim, and Benjamin Ho of KNOBBE, MARTENS, OLSON & BEAR LLP      2040 Main Street, 14th Floor
      Irvine, California 92614
      United States
      949-760-0404(phone)
      949-760-9502(fax)
      efiling@knobbe.com (authorized)
The attorney docket/reference number is B21C.059T.

The applicant's current Correspondence Information:

Linda H. Liu

KNOBBE, MARTENS, OLSON & BEAR LLP

2040 Main Street, 14th Floor

Irvine, California 92614

949-760-0404(phone)

949-760-9502(fax)

efiling@knobbe.com (authorized) E-mail Authorization: I authorize the USPTO to send e-mail correspondence concerning the application to the applicant, the applicant's attorney, or the applicant's domestic representative at the e-mail address provided in this application. I understand that a valid e-mail address must be maintained and that the applicant or the applicant's attorney must file the relevant subsequent application-related submissions via the Trademark Electronic Application System (TEAS). Failure to do so will result in the loss of TEAS Reduced Fee status and a requirement to submit an additional processing fee of $125 per international class of goods/services.

A fee payment in the amount of $275 has been submitted with the application, representing payment for 1 class(es).

Declaration

	Basis: If the applicant is filing the application based on use in commerce under 15 U.S.C. § 1051(a): The signatory believes that the applicant is the owner of the trademark/service mark sought to be registered; The mark is in use in commerce on or in connection with the goods/services in the application; The specimen(s) shows the mark as used on or in connection with the goods/services in the application; and To the best of the signatory's knowledge and belief, the facts recited in the application are accurate. And/Or If the applicant is filing the application based on an intent to use the mark in commerce under 15 U.S.C. § 1051(b), § 1126(d), and/or § 1126(e): The signatory believes that the applicant is entitled to use the mark in commerce; The applicant has a bona fide intention to use the mark in commerce on or in connection with the goods/services in the application; and To the best of the signatory's knowledge and belief, the facts recited in the application are accurate.
	To the best of the signatory's knowledge and belief, no other persons, except, if applicable, concurrent users, have the right to use the mark in commerce, either in the identical form or in such near resemblance as to be likely, when used on or in connection with the goods/services of such other persons, to cause confusion or mistake, or to deceive.
	To the best of the signatory's knowledge, information, and belief, formed after an inquiry reasonable under the circumstances, the allegations and other factual contentions made above have evidentiary support.
	The signatory being warned that willful false statements and the like are punishable by fine or imprisonment, or both, under 18 U.S.C. § 1001, and that such willful false statements and the like may jeopardize the validity of the application or submission or any registration resulting therefrom, declares that all statements made of his/her own knowledge are true and all statements made on information and belief are believed to be true.

Declaration Signature

Signature: /Linda H. Liu/   Date: 10/10/2018
Signatory's Name: Linda H. Liu
Signatory's Position: Attorney-of-Record, California bar member
Payment Sale Number: 88150374
Payment Accounting Date: 10/11/2018

Serial Number: 88150374
Internet Transmission Date: Wed Oct 10 19:05:47 EDT 2018
TEAS Stamp: USPTO/BAS-XXX.XXX.XX.XXX-201810101905476
98665-88150374-6103991bfe5209e2825bc514b
4c13ca96b2a7b42d8acced0596621ea4aa91503f
-CC-5919-20181010184940548280