VMLAUNCH

Versum Materials US, LLC

Application Filed: 2017-06-12
Trademark Application Details
Trademark Logo VMLAUNCH
819
Live/Pending
SU - REGISTRATION REVIEW COMPLETE
Research OneLook Acronym Finder
Serial Number87484868
Registration Number5961938
Mark Drawing Code4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form
Attorney NameAllison Z. Gifford
Attorney Docket Number188947-5005
Law Office AssignedN30
Employee NameNEHMER, JASON ROBERT

Timeline

2017-05-01Date of First Use
2017-06-12Application Filed
2018-04-24Published for Opposition
2019-12-11Location: PUBLICATION AND ISSUE SECTION
2019-12-11Status: Live/Pending
2019-12-12Transaction Date
2020-01-14Trademark Registered

Trademark Applicants & Owners

Owner: Versum Materials US, LLC
Address7201 Hamilton Blvd. Allentown DE 18195
Legal Entity TypeLimited Liability Company
Legal Entity StateDE

Documents

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Attorney of Record

Allison Z. Gifford
Stradley Ronon Stevens & Young, LLP
30 Valley Stream Parkway
Malvern, PA 19355

Good, Services, and Codes

International Codes:1
U.S. Codes:001,005,006,010,026,046
International Codes:6
U.S. Codes:002,012,013,014,023,025,050
International Codes:20
U.S. Codes:002,013,022,025,032,050
International Codes:42
U.S. Codes:100,101
Type CodeType
GS0011Liquid and gaseous chemicals, chemical compositions, chemical precursors, chemical products, high purity chemical gases and preparations for use in the electronics, semiconductor, and microelectromechanical industries, namely, chemicals used in the production of smart phones, personal computers, tablets, mobile computers, servers, memory storage devices, sensors for automobiles, security appliances, wearable articles, among other consumer and industrial products; liquid and gaseous chemicals, chemical compositions, chemical precursors, chemical products, high purity chemical gases, preparations, and chemical mechanical planarization slurries for use in the electronics, semiconductor, and microelectromechanical industries, namely, for use in the manufacture of silicon and compound semiconductors, flat panel displays, namely, thin film transistor-liquid crystal displays, light emitting diodes, photovoltaics, microelectromechanical and other electronic components; liquid and gaseous chemicals, chemical precursors, chemical products, chemical compositions, and high purity chemical gases for use as cleaning agents, chemical mechanical planarization, doping agents, lasers, etching agents, metallization agents, photoresist stripping agents, surface preparation agents, wafer cleaning agents, thin film deposition agents, chamber cleaning agents, post chemical mechanical planarization cleaning agents, and residue removal agents in the electronics, semiconductor and microelectromechanical industries
GS0011Liquid and gaseous chemicals, chemical compositions, chemical precursors, chemical products, high purity chemical gases and preparations for use in the electronics, semiconductor, and microelectromechanical industries, namely, chemicals used in the production of smart phones, personal computers, tablets, mobile computers, servers, memory storage devices, sensors for automobiles, security appliances, wearable articles, among other consumer and industrial products; liquid and gaseous chemicals, chemical compositions, chemical precursors, chemical products, high purity chemical gases, preparations, and chemical mechanical planarization slurries for use in the electronics, semiconductor, and microelectromechanical industries, namely, for use in the manufacture of silicon and compound semiconductors, flat panel displays, namely, thin film transistor-liquid crystal displays, light emitting diodes, photovoltaics, microelectromechanical and other electronic components; liquid and gaseous chemicals, chemical precursors, chemical products, chemical compositions, and high purity chemical gases for use as cleaning agents, chemical mechanical planarization, doping agents, lasers, etching agents, metallization agents, photoresist stripping agents, surface preparation agents, wafer cleaning agents, thin film deposition agents, chamber cleaning agents, post chemical mechanical planarization cleaning agents, and residue removal agents in the electronics, semiconductor and microelectromechanical industries

Trademark Filing History

DescriptionDateEvent Coding
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM2017-06-191 NWOS I:Incoming Correspondence
ASSIGNED TO EXAMINER2017-09-112 DOCK D:Assigned to Examiner
NON-FINAL ACTION WRITTEN2017-09-163 CNRT R:Renewal
NON-FINAL ACTION E-MAILED2017-09-164 GNRT F:First Action
NOTIFICATION OF NON-FINAL ACTION E-MAILED2017-09-165 GNRN O:Outgoing Correspondence
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED2017-10-176 REAP I:Incoming Correspondence
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED2017-10-177 ARAA I:Incoming Correspondence
TEAS RESPONSE TO OFFICE ACTION RECEIVED2018-03-068 TROA I:Incoming Correspondence
CORRESPONDENCE RECEIVED IN LAW OFFICE2018-03-069 CRFA I:Incoming Correspondence
TEAS/EMAIL CORRESPONDENCE ENTERED2018-03-0710 TEME I:Incoming Correspondence
APPROVED FOR PUB - PRINCIPAL REGISTER2018-03-1311 CNSA P:
ASSIGNED TO LIE2018-03-1812 ALIE A:Allowance for Publication
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED2018-04-0413 NONP E:E-Mail
PUBLISHED FOR OPPOSITION2018-04-2414 PUBO A:Allowance for Publication
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED2018-04-2415 NPUB E:E-Mail
NOA E-MAILED - SOU REQUIRED FROM APPLICANT2018-06-1916 NOAM E:E-Mail
TEAS EXTENSION RECEIVED2018-12-1917 EEXT I:Incoming Correspondence
EXTENSION 1 FILED2018-12-1918 EXT1 S:
EXTENSION 1 GRANTED2018-12-1919 EX1G S:
NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED2018-12-2120 EXRA E:E-Mail
TEAS STATEMENT OF USE RECEIVED2019-06-1921 EISU I:Incoming Correspondence
TEAS EXTENSION RECEIVED2019-06-1922 EEXT I:Incoming Correspondence
CASE ASSIGNED TO INTENT TO USE PARALEGAL2019-06-2423 AITU A:Allowance for Publication
EXTENSION 2 FILED2019-06-1924 EXT2 S:
EXTENSION 2 GRANTED2019-06-2425 EX2G S:
USE AMENDMENT FILED2019-06-1926 IUAF S:
STATEMENT OF USE PROCESSING COMPLETE2019-06-2427 SUPC I:Incoming Correspondence
SU - NON-FINAL ACTION - WRITTEN2019-06-2428 CNRT W:
NON-FINAL ACTION E-MAILED2019-06-2429 GNRT O:Outgoing Correspondence
NOTIFICATION OF NON-FINAL ACTION E-MAILED2019-06-2430 GNRN O:Outgoing Correspondence
NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED2019-06-2531 EXRA E:E-Mail
TEAS RESPONSE TO OFFICE ACTION RECEIVED2019-12-0932 TROA I:Incoming Correspondence
CORRESPONDENCE RECEIVED IN LAW OFFICE2019-12-1033 CRFA I:Incoming Correspondence
TEAS/EMAIL CORRESPONDENCE ENTERED2019-12-1034 TEME I:Incoming Correspondence
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED2019-12-1135 CNPR P:
NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED2019-12-1236 SUNA E:E-Mail
REGISTERED-PRINCIPAL REGISTER2020-01-1437 R.PR A:Allowance for Publication
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP2020-03-0438 ASGN I:Incoming Correspondence
TEAS CHANGE OF OWNER ADDRESS RECEIVED2020-04-0739 COAR I:Incoming Correspondence
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED2020-04-0740 REAP I:Incoming Correspondence
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED2020-04-0741 ARAA I:Incoming Correspondence
TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS2020-04-0742 EWAF I:Incoming Correspondence
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS2020-04-0743 ECDR I:Incoming Correspondence
TEAS CHANGE OF CORRESPONDENCE RECEIVED2020-04-0744 TCCA I:Incoming Correspondence
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED2020-04-0745 CHAN I:Incoming Correspondence
REVIEW OF CORRESPONDENCE COMPLETE - ADDRESS UPDATED2020-06-0446 CORV 1:

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