C.HORICOO
centrotherm international AG
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Acronym Finder
|
| Serial Number | 79278016 |
| Registration Number | 6235878 |
| Mark Drawing Code | 4000: Illustration: Drawing with word(s)/letter(s)/number(s) in Block form |
| Law Office Assigned | O30 |
| Employee Name | HISER, CHARLES |
Timeline
| 2019-08-21 | Application Filed |
| 2020-02-10 | Location: TMO LAW OFFICE 130 |
| 2020-02-10 | Status: Live/Pending |
| 2020-02-10 | Transaction Date |
| 2021-01-05 | Trademark Registered |
Trademark Applicants & Owners
| Owner: |  centrotherm international AG |
| Address | Württemberger StraÃe 31 89143 Blaubeuren DE |
| Legal Entity Type | Joint Stock Company |
| Legal Entity State | DE |
Documents
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Attorney of Record
Good, Services, and Codes
| International Codes: | 7 |
| U.S. Codes: | 013,019,021,023,031,034,035 |
| International Codes: | 9 |
| U.S. Codes: | 021,023,026,036,038 |
| International Codes: | 11 |
| U.S. Codes: | 013,021,023,031,034 |
| International Codes: | 37 |
| U.S. Codes: | 100,103,106 |
| Type Code | Type |
|---|---|
| GS0071 | Machines for processing wafers; surface treatment machines, especially for wafers, by diffusion at low pressure or vapor deposition chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition (LPCVD) or at atmospheric pressure or plasma enhanced; machines and apparatus (horizontal furnaces) for thermal treatment, chemical vapor deposition and manufacturing processes |
| GS0071 | Machines for processing wafers; surface treatment machines, especially for wafers, by diffusion at low pressure or vapor deposition chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD) and low pressure chemical vapor deposition (LPCVD) or at atmospheric pressure or plasma enhanced; machines and machinery apparatus containing horizontal furnaces for thermal treatment, chemical vapor deposition and manufacturing processes |
Trademark Filing History
| Description | Date | Event Coding |
|---|---|---|
| SN ASSIGNED FOR SECT 66A APPL FROM IB | 2020-02-06 | 1 REPR M: |
| NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM | 2020-02-10 | 2 NWOS I:Incoming Correspondence |
| ASSIGNED TO EXAMINER | 2020-02-10 | 3 DOCK D:Assigned to Examiner |
| NON-FINAL ACTION WRITTEN | 2020-02-13 | 4 CNRT R:Renewal |
| APPLICATION FILING RECEIPT MAILED | 2020-02-14 | 5 MAFR O:Outgoing Correspondence |
| NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | 2020-02-14 | 6 RFCR E:E-Mail |
| REFUSAL PROCESSED BY MPU | 2020-03-11 | 7 RFRR P: |
| NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | 2020-03-11 | 8 RFCS P: |
| REFUSAL PROCESSED BY IB | 2020-03-28 | 9 RFNT P: |
| TEAS RESPONSE TO OFFICE ACTION RECEIVED | 2020-09-11 | 10 TROA I:Incoming Correspondence |
| CORRESPONDENCE RECEIVED IN LAW OFFICE | 2020-09-11 | 11 CRFA I:Incoming Correspondence |
| TEAS/EMAIL CORRESPONDENCE ENTERED | 2020-09-12 | 12 TEME I:Incoming Correspondence |
| APPROVED FOR PUB - PRINCIPAL REGISTER | 2020-09-14 | 13 CNSA O:Outgoing Correspondence |
| NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | 2020-09-30 | 14 NONP E:E-Mail |
| NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | 2020-09-30 | 15 OP2R P: |
| PUBLISHED FOR OPPOSITION | 2020-10-20 | 16 PUBO A:Allowance for Publication |
| OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | 2020-10-20 | 17 NPUB E:E-Mail |
| REGISTERED-PRINCIPAL REGISTER | 2021-01-05 | 18 R.PR A:Allowance for Publication |
| NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | 2021-01-26 | 19 OPNS P: |
| NOTIFICATION PROCESSED BY IB | 2021-02-14 | 20 GPNX P: |
| FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | 2021-04-05 | 21 FICR P: |
| FINAL DISPOSITION PROCESSED | 2021-04-08 | 22 FIMP P: |
| FINAL DISPOSITION NOTICE SENT TO IB | 2021-04-08 | 23 FICS P: |
| FINAL DECISION TRANSACTION PROCESSED BY IB | 2021-05-02 | 24 FINO P: |
| NEW REPRESENTATIVE AT IB RECEIVED | 2022-07-15 | 25 NREP P: |
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