KCTECH
Kc Co., Ltd.
The mark consists of the stylized letters "KCTECH". "KC" is colored red. "TECH" is colored grey.
Mark For: KCTECH® trademark registration is intended to cover the categories of
>The color(s) red and grey is/are claimed as a feature of the mark. The mark consists of the stylized letters "KCTECH". "KC" is colored red. "TECH" is colored grey.
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OneLook
Acronym Finder
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| Serial Number | 79224246 |
| Registration Number | 5619639 |
| Mark Literal Elements | KCTECH |
| Mark Drawing Type | 5 - AN ILLUSTRATION DRAWING WITH WORD(S) /LETTER(S)/ NUMBER(S) INSTYLIZED FORM |
| Mark Type | TRADEMARK. SERVICE MARK |
| Standard Character Claim | No |
| Register | PRINCIPAL |
| Current Location | PUBLICATION AND ISSUE SECTION 2018-12-04 |
| Basis | 66(a) |
| Class Status | ACTIVE |
| Primary US Classes |
|
| Primary International Class |
|
| Filed Use | No |
| Current Use | No |
| Intent To Use | No |
| Filed ITU | No |
| 44D Filed | No |
| 44E Current | No |
| 66A Current | Yes |
| Current Basis | No |
| No Basis | No |
| Attorney Name | John J. O'Malley |
| Attorney Docket Number | MUH-TM003WO- |
| Law Office Assigned | L50 |
| Employee Name | TENG, SIMON |
Timeline
| 2017-05-22 | Application Filed |
| 2018-09-18 | Published |
| 2018-09-18 | Published for Opposition |
| 2018-12-04 | Location: PUBLICATION AND ISSUE SECTION |
| 2018-12-04 | Status: Live/Registered |
| 2018-12-04 | Status: Registered. The registration date is used to determine when post-registration maintenance documents are due. |
| 2018-12-04 | Trademark Registered |
| 2019-03-29 | Transaction Date |
| 2023-12-04 | Maintenance Early File Date |
| 2024-12-04 | Maintenance On Time Date |
| 2025-06-04 | Maintenance Late Fee Date |
Trademark Parties (Applicants & Owners)
| Party: |  KC CO., LTD. |
| Address | 39, Je2gongdan 2-gil Miyang-myeon, Anseong-si Gyeonggi-do KOREA, REPUBLIC OF |
| Legal Entity Type | Corporation |
| Legal Entity State | KOREA, REPUBLIC OF |
Documents
 Application | MULTI | 2018-01-04 |
 Drawing | JPEG | 2018-01-04 |
| Filing Receipt Trademark Application | XML | 2018-01-13 |
| Offc Action Outgoing | MULTI | 2018-01-16 |
| XSearch Search Summary | XML | 2018-01-16 |
| IB-1rst Refusal Note | MULTI | 2018-01-24 |
| IB-Processed Transaction | XML | 2018-02-15 |
| IR-Name Address Change | XML | 2018-02-15 |
| Response to Office Action | MULTI | 2018-07-24 |
| Notation to File | XML | 2018-08-14 |
| Amendment and Mail Process Complete | MULTI | 2018-08-15 |
| TRAM Snapshot of App at Pub for Oppostn | MULTI | 2018-08-15 |
| IB-Opposition Notice To | APPLICATION/XML | 2018-08-29 |
| Notice of Publication | XML | 2018-08-29 |
| Notification Of Notice of Publication | XML | 2018-08-29 |
| IB-Processed Transaction | XML | 2018-09-13 |
| OG Publication Confirmation | APPLICATION/XML | 2018-09-18 |
| Registration Certificate | 2018-12-04 | |
| IR-Rep Change | XML | 2018-12-06 |
| IB-Final Disposal To | XML | 2019-03-11 |
| IB-Processed Transaction | XML | 2019-03-28 |
Attorney of Record
Good, Services, and Codes
IC 001. US 001 005 006 010 026 046. G & S: Auxiliary fluids for use with abrasives in the semiconductor industry; chemical slurries for polishing semiconductors and mechanical electronic substrates; chemical mechanical planarization slurry for semiconductors and mechanical electronic substrates; ceria slurries for abrading semiconductor for industrial purposes; epoxy resins, unprocessed; unprocessed acrylonitrile butadiene styrene resins; unprocessed styrene acrylonitrile resins; unprocessed phenolic resins; unprocessed polyallylate resins; unprocessed polyamide resins; unprocessed polyester resins; unprocessed polymethyl metacrylate resins; plasma, exposed, or etching gasses, namely, silane gas, dichlorosilane gas, disilane gas, nitrogen trifluoride gas, and tungsten hexafluoride gas for processing semiconductors and for semiconductor manufacturing processes
IC 007. US 013 019 021 023 031 034 035. G & S: Semiconductor wafer processing machines; wet cleaning machines for manufacture of semiconductors for research and development; semiconductor processing machines; chemical mechanical polishing apparatus for semiconductor wafer; abrasive machine for semiconductor wafer; semiconductor wafer support processing equipment and machines; semiconductor processing equipment for research and development; wet cleaning equipment for manufacture of semiconductors; cleaning machines for semiconductor wafer; deposition equipment in the nature of organic light emitting diode wet stations for manufacture of semiconductors and LCDs, namely, wet stations for use to clean, etch, strip, rinse, and dry semiconductor wafers and LCDs; vacuum pump for manufacture of semiconductors; modified chemical vapor deposition machine for manufacturing semiconductors; power-driven cleaning scrubbers for manufacturing semiconductors; gas cabinet filters and purifier for machines for manufacturing semiconductors, namely, filters and purifiers for removing contaminants from gases used in the semiconductor industry; cleaning equipment for LCD industry and supplies, namely, cleaning machines for LCD parts and components; manufacturing machines for liquid crystal display devices; photoresist coating machines; substrate surface plasma etching and cutting machines; cleaning machines for flat panel display using CO2; gas supply valves being parts of machines
IC 042. US 100 101. G & S: Computer aided design of molds; design of machinery; design of machines and apparatus; design of semiconductors; design of integrated circuit; research on construction technology; quality control for others; design of parts of machines; mechanical drawing services; research relating to mechanical engineering; mechanical research; chemistry consultation services; chemical research and analysis; chemical research; product analysis, namely, product failure analysis services; product testing; product quality testing services relating to product stability
| International Codes: | 1 |
| U.S. Codes: | 001,005,006,010,026,046 |
| International Codes: | 7 |
| U.S. Codes: | 013,019,021,023,031,034,035 |
| International Codes: | 42 |
| U.S. Codes: | 100,101 |
| Type Code | Type |
|---|---|
| CC0000 | The color(s) red and grey is/are claimed as a feature of the mark. |
Assignments
| Description | Date |
|---|---|
 Trademark Assignment 6267-0423 [2 Pages] | 2018-02-15 |
Trademark Filing History
| Description | Date | Proceeding Number |
|---|---|---|
| FINAL DECISION TRANSACTION PROCESSED BY IB | 2019-03-29 | |
| FINAL DISPOSITION PROCESSED | 2019-03-11 | 73787 |
| FINAL DISPOSITION NOTICE SENT TO IB | 2019-03-11 | |
| FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB | 2019-03-04 | |
| NEW REPRESENTATIVE AT IB RECEIVED | 2018-12-07 | |
| REGISTERED-PRINCIPAL REGISTER | 2018-12-04 | |
| PUBLISHED FOR OPPOSITION | 2018-09-18 | |
| OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED | 2018-09-18 | |
| NOTIFICATION PROCESSED BY IB | 2018-09-15 | |
| NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB | 2018-08-29 | |
| NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED | 2018-08-29 | |
| NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB | 2018-08-29 | |
| TEAS/EMAIL CORRESPONDENCE ENTERED | 2018-08-14 | 74221 |
| CORRESPONDENCE RECEIVED IN LAW OFFICE | 2018-08-14 | 74221 |
| APPROVED FOR PUB - PRINCIPAL REGISTER | 2018-08-14 | |
| ASSIGNED TO LIE | 2018-08-13 | 74221 |
| TEAS RESPONSE TO OFFICE ACTION RECEIVED | 2018-07-24 | |
| REFUSAL PROCESSED BY IB | 2018-02-16 | |
| CHANGE OF NAME/ADDRESS REC'D FROM IB | 2018-02-16 | |
| REFUSAL PROCESSED BY MPU | 2018-01-24 | 67445 |
| NON-FINAL ACTION MAILED - REFUSAL SENT TO IB | 2018-01-24 | |
| NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW | 2018-01-17 | |
| NON-FINAL ACTION WRITTEN | 2018-01-16 | 83698 |
| APPLICATION FILING RECEIPT MAILED | 2018-01-13 | |
| NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM | 2018-01-09 | |
| ASSIGNED TO EXAMINER | 2018-01-09 | 83698 |
| SN ASSIGNED FOR SECT 66A APPL FROM IB | 2018-01-04 |
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