Mark For: NANOOCS™ trademark registration is intended to cover the categories of overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference may be corrected on future exposures. [all]
Status
2022-07-28 UTC
DEAD APPLICATION Refused Dismissed or Invalidated
This trademark application was refused, dismissed, or invalidated by the Office and this application is no longer active.
(Electrical and scientific apparatus) Scientific, nautical, surveying, electric, photographic, cinematographic, optical, weighing, measuring, signaling, checking (supervision), lifesaving and teaching apparatus and instruments; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire-extinguishing apparatus.
Filed Use
No
Current Use
No
Intent To Use
Yes
Filed ITU
Yes
44D Filed
No
44E Current
No
66A Current
No
Current Basis
No
No Basis
No
Law Office Assigned
L30
Employee Name
FINK, GINA M
Timeline
2002-04-02
Application Filed
2002-11-19
Published
2002-11-19
Published for Opposition
2003-08-12
Abandon
2003-08-12
Status: Abandoned because no Statement of Use or Extension Request timely filed after Notice of Allowance was issued. To view all docume
NANOMETRICS INCORPORATED 1550 BUCKEYE DRIVE MILPITAS, CA. 95035-7418
Good, Services, and Codes
(ABANDONED) IC 009. US 021 023 026 036 038. G & S: Overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference may be corrected on future exposures
International Codes:
9
U.S. Codes:
021,023,026,036,038
Type Code
Type
GS0091
Overlay optical metrology systems comprised of measurement optics, wafer handling mechanisms and system control hardware and software for measuring the difference between two nearly coincident patterns on a sample, such as a semiconductor wafer, which patterns are formed by a process such as photolithography, and which patterns are overlaid, one on top of the other and the overlay difference or error may be fed back to the exposure system that created the patterns so that this difference may be corrected on future exposures
Trademark Filing History
Description
Date
Proceeding Number
ABANDONMENT - NO USE STATEMENT FILED
2003-10-01
NOA MAILED - SOU REQUIRED FROM APPLICANT
2003-02-11
PUBLISHED FOR OPPOSITION
2002-11-19
NOTICE OF PUBLICATION
2002-10-30
APPROVED FOR PUB - PRINCIPAL REGISTER
2002-09-16
PAPER RECEIVED
2002-08-26
CORRESPONDENCE RECEIVED IN LAW OFFICE
2002-08-26
NON-FINAL ACTION MAILED
2002-08-08
ASSIGNED TO EXAMINER
2002-07-25
76464
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.