BARRACUDA

STEAG MicroTech GmbH

Application Filed: 2000-06-20
Trademark Application Details
Trademark Logo BARRACUDA

Mark For: BARRACUDA® trademark registration is intended to cover the categories of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces. [all]

Status

2022-10-12 UTC
DEAD REGISTRATION Cancelled Invalidated
The trademark application was registered, but subsequently it was cancelled or invalidated and removed from the registry.


Research OneLook Acronym Finder
Serial Number76075632
Registration Number2648048
Mark Literal ElementsBARRACUDA
Mark Drawing Type1 - TYPESET WORD(S) /LETTER(S) /NUMBER(S)
Mark TypeTRADEMARK. SERVICE MARK
Standard Character ClaimNo
RegisterPRINCIPAL
Current LocationSCANNING ON DEMAND 2008-01-08
Basis44(e)
Class StatusSECTION 8 - CANCEL
Primary US Classes
  • 013: Hardware, Plumbing and Steamfitting Supplies
  • 019: Vehicles
  • 021: Electrical Apparatus, Machines and Supplies
  • 023: Cutlery, Machinery, Tools and Parts Thereof
  • 031: Filters and Refrigerators
  • 034: Heating, Lighting and Ventilating Apparatus
  • 035: Belting, Hose, Machinery Packing and Non-Metallic Tires
Primary International Class
  • 007 - Primary Class
  • (Machinery) Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
Filed UseNo
Current UseNo
Intent To UseNo
Filed ITUNo
44D FiledYes
44E CurrentYes
66A CurrentNo
Current BasisNo
No BasisNo
Cancellation Code2
Domestic RepresentativeROBERT W. BECKER & ASSOCIATES
Attorney NameRobert W. Becker
Law Office AssignedM50
Employee NameHAN, DAWN L

Timeline

2000-06-20Application Filed
2002-08-20Published
2002-08-20Published for Opposition
2002-11-12Trademark Registered
2008-01-08Location: SCANNING ON DEMAND
2009-06-20Cancelled
2009-06-20Status: Dead/Cancelled
2009-06-20Status: Registration cancelled because registrant did not file an acceptable declaration under Section 8. To view all documents in this
2018-07-08Transaction Date

Trademark Parties (Applicants & Owners)

Party: STEAG MicroTech GmbH
AddressCarl-Benz-Strasse 10 72124 Pliezhausen GERMANY
Legal Entity TypeLimited Liability Company
Legal Entity StateGERMANY

Documents

ApplicationIMAGE/TIFF2000-06-20
DrawingIMAGE/TIFF2000-06-20
Paper Correspondence Incoming2002-04-24
Registration Certificate2002-11-12
Registration CertificateIMAGE/TIFF2002-11-12
Change of AddressIMAGE/TIFF2002-11-17
File Jacket2008-01-02
Unclassified2008-01-02

Attorney of Record

Robert W. Becker
Robert W. Becker & Associates
707 Highway 66 East, Suite B
Tijeras NM 87059

Good, Services, and Codes

(CANCELLED)
IC 007. US 013 019 021 023 031 034 035. G & S: Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces(CANCELLED)
IC 037. US 100 103 106. G & S: Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces

International Codes:7
U.S. Codes:013,019,021,023,031,034,035
International Codes:37
U.S. Codes:100,103,106
Type CodeType
GS0071Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces

Trademark Filing History

DescriptionDateProceeding Number
CANCELLED SEC. 8 (6-YR)2009-06-20
CASE FILE IN TICRS2008-01-08
ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY2008-01-02
TEAS CHANGE OF CORRESPONDENCE RECEIVED2002-11-17
REGISTERED-PRINCIPAL REGISTER2002-11-12
PUBLISHED FOR OPPOSITION2002-08-20
NOTICE OF PUBLICATION2002-07-31
APPROVED FOR PUB - PRINCIPAL REGISTER2002-03-18
EXAMINERS AMENDMENT MAILED2002-03-14
EXAMINERS AMENDMENT MAILED2002-03-06
CORRESPONDENCE RECEIVED IN LAW OFFICE2001-12-18
CORRESPONDENCE RECEIVED IN LAW OFFICE2001-12-14
NON-FINAL ACTION MAILED2001-06-14
ASSIGNED TO EXAMINER2001-06-1278428
SEC. 44(D) CLAIM DELETED2000-08-2971466
PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED2000-08-29

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