Mark For: VSEA® trademark registration is intended to cover the categories of semiconductor manufacturing machines, logic chip manufacturing machines and memory chip manufacturing machines, namely, large volume end stations comprised of tandem accelerators, cryopumps, and ion source, dual vaporizers and three-access electrode manipulators; machines for implanting ions in semiconductor wafers; vacuum pumps of the turbo molecular type used for obtaining clean, high vacuum environments in such applications as analytical instrumentation, semiconductor production, high energy physics, electron devices and materials research; [ physical vapor deposition machines; ] and complete ion implantation machines comprised of ion sources, ion accelerators and scanners, processing chambers, vacuum systems, power supplies and controls, ion sources.
Status
2021-07-26 UTC
LIVE REGISTRATION Issued and Active
The trademark application has been registered with the Office.
035:
Belting, Hose, Machinery Packing and Non-Metallic Tires
Primary International Class
007 - Primary Class
(Machinery) Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
Alan Taboada Moser Taboada 1030 Broad Street - Suite 203 Shrewsbury NJ 07702
Good, Services, and Codes
International Codes:
7
U.S. Codes:
013,019,021,023,031,034,035
International Codes:
9
U.S. Codes:
021,023,026,036,038
International Codes:
42
U.S. Codes:
100,101
Type Code
Type
GS0071
Semiconductor manufacturing machines, logic chip manufacturing machines and memory chip manufacturing machines, namely, large volume end stations comprised of tandem accelerators, cryopumps, and ion source, dual vaporizers and three-access electrode manipulators; machines for implanting ions in semiconductor wafers; vacuum pumps of the turbo molecular type used for obtaining clean, high vacuum environments in such applications as analytical instrumentation, semiconductor production, high energy physics, electron devices and materials research; [ physical vapor deposition machines; ] and complete ion implantation machines comprised of ion sources, ion accelerators and scanners, processing chambers, vacuum systems, power supplies and controls, ion sources
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
2021-05-07
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
2017-06-29
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
2017-06-29
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
2012-05-16
67603
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
2012-05-16
67603
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
2012-05-16
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
2012-05-16
67603
TEAS SECTION 8 & 9 RECEIVED
2012-05-04
REGISTERED - SEC. 8 (6-YR) ACCEPTED
2008-05-28
64591
ASSIGNED TO PARALEGAL
2008-05-20
64591
TEAS SECTION 8 RECEIVED
2008-05-05
CASE FILE IN TICRS
2007-08-24
REGISTERED-PRINCIPAL REGISTER
2002-05-07
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
2002-01-24
CORRESPONDENCE RECEIVED IN LAW OFFICE
2001-12-13
NON-FINAL ACTION MAILED
2001-06-25
STATEMENT OF USE PROCESSING COMPLETE
2001-06-13
USE AMENDMENT FILED
2001-05-23
EXTENSION 2 GRANTED
2001-05-15
EXTENSION 2 FILED
2001-05-02
EXTENSION 1 GRANTED
2001-01-16
EXTENSION 1 FILED
2000-11-01
NOA MAILED - SOU REQUIRED FROM APPLICANT
2000-05-02
PUBLISHED FOR OPPOSITION
2000-02-08
NOTICE OF PUBLICATION
2000-01-07
APPROVED FOR PUB - PRINCIPAL REGISTER
1999-11-30
CORRESPONDENCE RECEIVED IN LAW OFFICE
1999-11-10
NON-FINAL ACTION MAILED
1999-06-08
ASSIGNED TO EXAMINER
1999-06-05
69812
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